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过渡金属硫化物垂直异质结构的低温大规模制备及其在光电探测器中的应用

Low-Temperature and Large-Scale Production of a Transition Metal Sulfide Vertical Heterostructure and Its Application for Photodetectors.

作者信息

Kanade Chaitanya Kaluram, Seok Hyunho, Kanade Vinit Kaluram, Aydin Kubra, Kim Hyeong-U, Mitta Sekhar Babu, Yoo Won Jong, Kim Taesung

机构信息

SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 16419, Republic of Korea.

Plasma Engineering Laboratory, Korea Institute of Machinery and Materials (KIMM), Daejeon 34103, Korea.

出版信息

ACS Appl Mater Interfaces. 2021 Feb 24;13(7):8710-8717. doi: 10.1021/acsami.0c19666. Epub 2021 Feb 10.

Abstract

The conventional synthesis of two-dimensional (2D) transition metal dichalcogenide (TMDC) heterostructures is low yielding and lack the heterojunction interface quality. The chemical vapor deposition (CVD) techniques have achieved high-quality heterostructure interfaces but require a high synthesis temperature (>600 °C) and have a low yield of heterostructures. Therefore, the large scale and high interface quality of TMDC heterojunctions using low-temperature synthesis methods are in demand. Here, high-quality, wafer-scale MoS and WS heterostructures with 2D interfaces were prepared by a one-step sulfurization of the molybdenum (Mo) and tungsten (W) precursors via plasma-enhanced CVD at a relatively low temperature (150 °C). The 4 inch wafer-scale synthesis of the MoS-WS heterostructures was validated using various spectroscopic and microscopic techniques. Further, the photocurrent generation and photoswitching phenomenon of the so-obtained MoS-WS heterostructures were studied. The photodevice prepared by the MoS-WS heterostructures at 150 °C showed a photoresponsivity of 83.75 mA/W. The excellent photoresponse and faster photoswitching highlight the advantage of MoS-WS heterostructures toward advanced photodetectors.

摘要

二维(2D)过渡金属二硫属化物(TMDC)异质结构的传统合成产率低且异质结界面质量欠佳。化学气相沉积(CVD)技术虽已实现高质量的异质结构界面,但需要较高的合成温度(>600°C)且异质结构的产率较低。因此,需要使用低温合成方法来大规模制备具有高界面质量的TMDC异质结。在此,通过在相对低温(150°C)下经由等离子体增强CVD对钼(Mo)和钨(W)前驱体进行一步硫化,制备了具有二维界面的高质量、晶圆级MoS和WS异质结构。使用各种光谱和显微镜技术验证了MoS-WS异质结构的4英寸晶圆级合成。此外,还研究了如此获得的MoS-WS异质结构的光电流产生和光开关现象。在150°C下由MoS-WS异质结构制备的光电器件表现出83.75 mA/W的光响应度。优异的光响应和更快的光开关突出了MoS-WS异质结构在先进光电探测器方面的优势。

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