Goyal Gagan K, Dasgupta Titas
Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Mumbai 400 076, India.
ACS Appl Mater Interfaces. 2021 May 5;13(17):20754-20762. doi: 10.1021/acsami.0c19485. Epub 2021 Apr 25.
Metallization (known as contacting) of thermoelectric (TE) legs is vital to the long-term performance of a TE device. It is often observed that the compositional changes in a TE solid solution may render a given contact material unsuitable due to a mismatch in the thermal expansion coefficient values. Finding suitable contact materials for TE solid solutions (which often are the best TE materials) remains a challenge. In this work, we propose a multilayer single-step approach in which the same combination of contact materials can be used for a wide compositional range in a solid solution. The outer layer is a metal foil, which helps in creating an Ohmic contact with the interconnects. The intermediate layer is a mixture of the TE material and a metal powder, which results in the formation of the diffusion barrier. The innermost layer is the TE material, which is the active component of the device. The strategy was applied on n- and p-doped MgSiSn with elemental Cu and Ni providing the desired interface functionalities. Single-step compaction was carried out using the monoblock sintering technique. Microscopic investigation reveals the formation of a well-bonded crack-free interface. Various intermetallic phases were identified at the interface, and the formation of the MgNiSn phase was found to be critical to prevent any interdiffusion of elements. Electrical contact resistance () measurements were conducted, and low values of 3 and 19 μΩ cm were measured in n- and p-type legs, respectively. The contacted TE legs were further annealed at 400 °C for 7 days to check their stability. Microstructural and electrical resistance measurements reveal minimal changes in the interface layer and values, indicating the workability of the multilayer technique.
热电(TE)腿的金属化(也称为接触)对于TE器件的长期性能至关重要。人们经常观察到,由于热膨胀系数值不匹配,TE固溶体中的成分变化可能会使给定的接触材料变得不合适。为TE固溶体(通常是最好的TE材料)寻找合适的接触材料仍然是一个挑战。在这项工作中,我们提出了一种多层单步方法,其中相同的接触材料组合可用于固溶体中广泛的成分范围。外层是金属箔,有助于与互连形成欧姆接触。中间层是TE材料和金属粉末的混合物,可形成扩散阻挡层。最内层是TE材料,它是器件的活性成分。该策略应用于n型和p型掺杂的MgSiSn,元素Cu和Ni提供所需的界面功能。使用整体烧结技术进行单步压实。微观研究揭示了形成了良好结合且无裂纹的界面。在界面处鉴定出各种金属间相,发现MgNiSn相的形成对于防止元素的任何相互扩散至关重要。进行了电接触电阻()测量,在n型和p型腿中分别测得低至3和19μΩ·cm的值。将接触后的TE腿在400°C下进一步退火7天,以检查其稳定性。微观结构和电阻测量表明,界面层和值变化极小,表明多层技术的可行性。