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通过铟/铅共掺杂提高近室温下的锗碲热电材料性能

Enhancing Near-Room-Temperature GeTe Thermoelectrics through In/Pb Co-doping.

作者信息

Li Juan, Hu Qing, He Shan, Tan Xiaobo, Deng Qian, Zhong Yan, Zhang Fujie, Ang Ran

机构信息

Key Laboratory of Radiation Physics and Technology, Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, China.

Institute of New Energy and Low-Carbon Technology, Sichuan University, Chengdu 610065, China.

出版信息

ACS Appl Mater Interfaces. 2021 Aug 11;13(31):37273-37279. doi: 10.1021/acsami.1c11599. Epub 2021 Jul 28.

Abstract

The traditional thermoelectric material GeTe has drawn much attention recently because of the reported high thermoelectric performance of the rhombohedral phase in low-temperature ranges, where the split and Σ band can be reconverged to have a small energy offset and thus high density of state effective mass according to the rhombohedral angle. In addition, In doping in GeTe is also reported to enhance the density of effective mass and therefore increase the Seebeck coefficient because of the induced resonant levels. In this work, In and Pb are doped in GeTe, and In doping leads to an increase in the rhombohedral angle and thus enhanced density of state effective mass in addition to the resonant effect. However, the improved Seebeck coefficient result from In doping is compensated for by a sharp reduction of Hall mobility, leading to no significant enhancement of electronic performance in the rhombohedral phase. By further Pb/Ge doping in the matrix GeInTe for the optimization of carrier concentration and reduction of lattice thermal conductivity (as low as 0.7 W/mK), a as high as ∼1.2 at 550 K and average of ∼0.75 between 300 and 550 K are realized in this work, demonstrating GeTe as a promising candidate for near-room-temperature application.

摘要

传统热电材料GeTe近来备受关注,因为据报道其菱方相在低温范围内具有较高的热电性能,在该温度范围内,分裂的Σ能带能够重新汇聚,根据菱方角具有较小的能量偏移,进而具有较高的态密度有效质量。此外,据报道在GeTe中掺杂In也会提高有效质量密度,并且由于诱导的共振能级而增加塞贝克系数。在本工作中,在GeTe中掺杂了In和Pb,除共振效应外,In掺杂导致菱方角增大,从而提高了态密度有效质量。然而,In掺杂导致的塞贝克系数提高被霍尔迁移率的急剧降低所抵消,导致菱方相的电子性能没有显著增强。通过在基体GeInTe中进一步进行Pb/Ge掺杂以优化载流子浓度并降低晶格热导率(低至0.7W/mK),本工作在550K时实现了高达~1.2的热电优值,在300K至550K之间平均热电优值约为0.75,表明GeTe是近室温应用的有前景的候选材料。

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