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表面活性剂浓度和疏水性对二氧化硅表面水排列的影响。

Effect of Surfactant Concentration and Hydrophobicity on the Ordering of Water at a Silica Surface.

作者信息

Shi Lirong, McMillan Janet R, Yu Decai, Chen Xiaoyun, Tucker Christopher J, Wasserman Eric, Mohler Carol, Chen Zhan

机构信息

Department of Chemistry, University of Michigan, Ann Arbor, Michigan 48109, United States.

Core R&D, The Dow Chemical Company, Midland, Michigan 48674, United States.

出版信息

Langmuir. 2021 Sep 14;37(36):10806-10817. doi: 10.1021/acs.langmuir.1c01731. Epub 2021 Aug 29.

Abstract

The performance of nonionic surfactants is mediated by the interfacial interactions at the solid-liquid interface. Here we applied sum frequency generation (SFG) vibrational spectroscopy to probe the molecular structure of the silica-nonionic surfactant solution interface in situ, supplemented by quartz crystal microbalance with dissipation monitoring (QCM-D) and molecular dynamics (MD) simulations. The combined studies elucidated the effects of nonionic surfactant solution concentration, surfactant composition, and rinsing on the silica-surfactant solution interfacial structure. The nonionic surfactants studied include ethylene-oxide (EO) and butylene oxide (BO) components with different ratios. It was found that the CH groups of the surfactants at the silica-surfactant solution interfaces are disordered, but the interfacial water molecules are ordered, generating strong SFG OH signals. Solutions with higher concentrations of surfactant lead to a slightly higher amount of adsorbed surfactant at the silica interface, resulting in more water molecules being ordered at the interface, or a higher ordering of water molecules at the interface, or both. MD simulation results indicated that the nonionic surface molecules preferentially adsorb onto silanol sites on silica. A surfactant with a higher EO/BO ratio leads to more water molecules being ordered and a higher degree of ordering of water molecules at the silica-surfactant solution interface, exhibiting stronger SFG OH signal, although less material is adsorbed according to the QCM-D data. A thin layer of surfactants remained on the silica surface after multiple water rinses. To the best of our knowledge, this is the first time the combined approaches of SFG, QCM-D and MD simulation techniques have been applied to study nonionic surfactants at the silica-solution interface, which enhances our understanding on the interfacial interactions between nonionic surfactants, water and silica. The knowledge obtained from this study can be helpful to design the optimal surfactant concentration and composition for future applications.

摘要

非离子表面活性剂的性能是由固液界面处的界面相互作用介导的。在此,我们应用和频振动光谱(SFG)原位探测二氧化硅 - 非离子表面活性剂溶液界面的分子结构,并辅以带耗散监测的石英晶体微天平(QCM - D)和分子动力学(MD)模拟。综合研究阐明了非离子表面活性剂溶液浓度、表面活性剂组成和冲洗对二氧化硅 - 表面活性剂溶液界面结构的影响。所研究的非离子表面活性剂包括具有不同比例的环氧乙烷(EO)和环氧丁烷(BO)组分。研究发现,二氧化硅 - 表面活性剂溶液界面处表面活性剂的CH基团是无序的,但界面水分子是有序的,产生强烈的SFG OH信号。表面活性剂浓度较高的溶液会导致二氧化硅界面处吸附的表面活性剂数量略多,从而使更多水分子在界面处有序排列,或者界面处水分子的有序程度更高,或者两者兼而有之。MD模拟结果表明,非离子表面分子优先吸附到二氧化硅上的硅醇位点上。EO/BO比例较高的表面活性剂会导致更多水分子有序排列,且在二氧化硅 - 表面活性剂溶液界面处水分子的有序程度更高,表现出更强的SFG OH信号,尽管根据QCM - D数据吸附的物质较少。多次用水冲洗后,二氧化硅表面仍残留一层薄薄的表面活性剂。据我们所知,这是首次将SFG、QCM - D和MD模拟技术的组合方法应用于研究二氧化硅 - 溶液界面处的非离子表面活性剂,这增强了我们对非离子表面活性剂、水和二氧化硅之间界面相互作用的理解。从这项研究中获得的知识有助于为未来应用设计最佳的表面活性剂浓度和组成。

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