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使用双探针扫描隧道显微镜对二维纳米加工硅结构进行欧姆接触。

Ohmic Contact to Two-Dimensional Nanofabricated Silicon Structures with a Two-Probe Scanning Tunneling Microscope.

作者信息

Onoda Jo, Khademi Ali, Wolkow Robert A, Pitters Jason

机构信息

Department of Physics, University of Alberta, Edmonton, Alberta T6G 2J1, Canada.

Metrology Research Centre, National Research Council of Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada.

出版信息

ACS Nano. 2021 Dec 28;15(12):19377-19386. doi: 10.1021/acsnano.1c05777. Epub 2021 Nov 15.

Abstract

We used multiprobe scanning tunneling microscope (STM) to fabricate and electrically characterize nanostructures on Si surfaces. We overcame resistive contacts by using field evaporation to clean tip apexes in order to create Ohmic contact with the Si surface states on a Si substrate. A two-probe (2P-) STM with Ohmic contact allowed for measurement at very low bias, limiting conduction through space-charge layer and bulk states. The Ohmic 2P-STM measurement clarified the surface conductivity of the Si(111)-(7 × 7) surface. We also confirmed that Ohmic 2P-STM can be replaced with more convenient Ohmic one-probe STM for the conductance measurements on the Si surface. We prepared nanostructures using STM lithography to define electronically isolated two-dimensional (2D) regions with various aspect ratios. Their surface conduction properties are described well by the conventional sheet model, proving the diffusive 2D conduction on the Si surface. Constrictions and breaks in 2D structures were also evaluated. Ohmic 2P-STM will be helpful for the investigation of exploratory atomic-scale circuitry or cutting-edge materials sciences.

摘要

我们使用多探针扫描隧道显微镜(STM)在硅表面制备纳米结构并对其进行电学表征。我们通过场蒸发清洁针尖顶端克服了电阻性接触,以便与硅衬底上的硅表面态形成欧姆接触。具有欧姆接触的双探针(2P-)STM允许在非常低的偏压下进行测量,限制了通过空间电荷层和体态的传导。欧姆2P-STM测量阐明了Si(111)-(7×7)表面的表面电导率。我们还证实,对于硅表面的电导测量,欧姆2P-STM可以被更方便的欧姆单探针STM所取代。我们使用STM光刻技术制备纳米结构,以定义具有各种纵横比的电子隔离二维(2D)区域。它们的表面传导特性可以用传统的面电阻模型很好地描述,证明了硅表面的扩散二维传导。还对二维结构中的收缩和断裂进行了评估。欧姆2P-STM将有助于探索性原子尺度电路或前沿材料科学的研究。

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