Wang Jun, Zhang Shuye, Shi Zhiyuan, Jiu Jinting, Wu Chunhui, Sugahara Tohru, Nagao Shijo, Suganuma Katsuaki, He Peng
State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology Harbin 150001 China
The Institute of Scientific and Industrial Research, Osaka University Ibaraki Osaka 567-0047 Japan.
RSC Adv. 2018 Dec 5;8(71):40740-40747. doi: 10.1039/c8ra02249f. eCollection 2018 Dec 4.
Topographical patterns are widely applied in many manufacturing areas due to the unique role in modifying performance related to physical, chemical and biological fundamentals. The patterns are usually realized by buckling or wrinkling, self-assembly or epitaxy, and lithography techniques. However, the combination of satisfactory controllability, ridge robustness, cost and dimensional precision is still difficult to achieve by any of the strategies above. A novel, simple and low-cost nanopatterning technique named "photodegradation copying method" with high technological flexibility has been initially proposed in this study. As a perfect example, a nanoridge-patterned surface has been successfully realized on a polymeric film thanks to the selective photodegradation of polymer and the shielding effect of silver nanowire (AgNW) networks. Roughness, wettability and transmittance of the polymeric film became simply and effectively controllable by adjusting the photodegradation time or the size and distribution of AgNWs. In addition, the ridge-patterned film could also be employed as a substrate in transfer printing for more flexible devices. Various topographical nanopatterns are expected to be simply realized by the photocopying method, just replacing nanowires with other masks like nanodisks, nanocubes, nanotriangles, and so on. This promising photocopying technique is believed to play an important role in the development of topographical nanopatterns, and enable more intriguing applications simply, flexibly and inexpensively.
由于在改变与物理、化学和生物学基本原理相关的性能方面具有独特作用，形貌图案在许多制造领域得到了广泛应用。这些图案通常通过屈曲或起皱、自组装或外延以及光刻技术来实现。然而，上述任何一种策略都难以实现令人满意的可控性、脊部稳健性、成本和尺寸精度的完美结合。本研究首次提出了一种新颖、简单且低成本的具有高工艺灵活性的纳米图案化技术，即“光降解复制法”。作为一个完美的例子，由于聚合物的选择性光降解和银纳米线（AgNW）网络的屏蔽作用，在聚合物薄膜上成功实现了纳米脊图案化表面。通过调节光降解时间或AgNWs的尺寸和分布，聚合物薄膜的粗糙度、润湿性和透光率变得简单且有效地可控。此外，脊图案化薄膜还可以用作转移印刷中更灵活器件的基板。预计通过这种复印方法可以简单地实现各种形貌纳米图案，只需将纳米线替换为其他掩膜，如纳米盘、纳米立方体、纳米三角形等。这种有前景的复印技术有望在形貌纳米图案的发展中发挥重要作用，并能够简单、灵活且廉价地实现更多有趣的应用。
