Jiang Xingan, Zhang Xiangping, Han Xiangyan, Lu Jianming, Wang Xueyun, Hong Jiawang
School of Aerospace Engineering, Beijing Institute of Technology, Beijing, 100081, China.
State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing 100871, China.
Nanoscale. 2022 Nov 3;14(42):15869-15874. doi: 10.1039/d2nr04817e.
The stacking heterostructure of graphene on bulk h-BN produces a moiré pattern with topographic corrugation. The corrugation of the moiré pattern expectantly induces a considerable curvature and a flexoelectric response, which calls for a detailed study. In this work, we used lateral force microscopy, a scanning technique to locally observe the moiré pattern and topographic corrugation. The curvature and flexoelectric potentials are derived from the measured topographic corrugation, revealing a huge curvature of ∼10 m and a flexoelectric potential of ∼10 mV in the hexagonal domain wall region (∼3-4 nm) of the moiré pattern. In addition, the domain walls of the moiré pattern also generate a clear electromechanical and frictional response, arising from the corrugation-induced flexoelectric response. In summary, the results of this work provide insights into the understanding of the flexoelectricity in the graphene/bulk h-BN and its associated electromechanical coupling behavior in the moiré pattern of a van der Waals stacking heterostructure.
石墨烯在块状六方氮化硼上的堆叠异质结构会产生具有地形起伏的莫尔条纹图案。莫尔条纹图案的起伏有望诱导出相当大的曲率和挠曲电响应,这需要进行详细研究。在这项工作中,我们使用横向力显微镜,一种用于局部观察莫尔条纹图案和地形起伏的扫描技术。曲率和挠曲电势由测量得到的地形起伏推导得出,揭示出在莫尔条纹图案的六边形畴壁区域(约3 - 4纳米)中存在约10米的巨大曲率和约10毫伏的挠曲电势。此外,莫尔条纹图案的畴壁还会产生明显的机电和摩擦响应,这是由起伏诱导的挠曲电响应引起的。总之,这项工作的结果为理解石墨烯/块状六方氮化硼中的挠曲电现象及其在范德华堆叠异质结构的莫尔条纹图案中相关的机电耦合行为提供了见解。