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在单层 SnTe 范德华异质结构中再现面外铁电性。

Reproduced out-of-plane ferroelectricity in monolayer SnTe van der Waals heterostructures.

机构信息

Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, People's Republic of China.

Department of Physics, Xiangtan University, Xiangtan 411105, People's Republic of China.

出版信息

J Phys Condens Matter. 2023 Jun 5;35(35). doi: 10.1088/1361-648X/acd906.

Abstract

Due to the shrinking in size of nonvolatile memory devices, the two-dimensional ferroelectric van der Waals (vdW) heterostructures have received huge attention. However, it is still difficult to maintain the out-of-plane (OOP) ferroelectricity. In this work, we have theoretically investigated the relationship between the ferroelectricity and the strain of bulk and few-layer SnTe by first-principles calculations. The results indicate that the-SnTe can exist stably within the strain between -6% and 6%, and the complete OOP polarization occurs within the strain between -4% and -2%. Unfortunately, the OOP polarization disappears while the bulk-SnTe is thinned to a few layers. However, the complete OOP polarization recurs in monolayer SnTe/PbSe vdW heterostructures, which is due to the strong interface coupling. Our findings provide an effective way to enhance ferroelectric performance, which is beneficial for the design of ultra-thin ferroelectric devices.

摘要

由于非易失性存储器件的尺寸不断缩小,二维铁电范德华(vdW)异质结构受到了极大的关注。然而,要保持面外(OOP)铁电性仍然很困难。在这项工作中,我们通过第一性原理计算理论研究了 bulk 和 few-layer SnTe 的铁电性与应变之间的关系。结果表明,-SnTe 可以在应变范围为-6%到 6%之间稳定存在,而完整的 OOP 极化发生在应变范围为-4%到-2%之间。不幸的是,当 bulk-SnTe 减薄到几个原子层时,OOP 极化会消失。然而,在单层 SnTe/PbSe vdW 异质结构中,完整的 OOP 极化会重新出现,这是由于界面耦合很强。我们的发现为增强铁电性提供了一种有效的方法,这有利于超薄铁电器件的设计。

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