Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, People's Republic of China.
Department of Physics, Xiangtan University, Xiangtan 411105, People's Republic of China.
J Phys Condens Matter. 2023 Jun 5;35(35). doi: 10.1088/1361-648X/acd906.
Due to the shrinking in size of nonvolatile memory devices, the two-dimensional ferroelectric van der Waals (vdW) heterostructures have received huge attention. However, it is still difficult to maintain the out-of-plane (OOP) ferroelectricity. In this work, we have theoretically investigated the relationship between the ferroelectricity and the strain of bulk and few-layer SnTe by first-principles calculations. The results indicate that the-SnTe can exist stably within the strain between -6% and 6%, and the complete OOP polarization occurs within the strain between -4% and -2%. Unfortunately, the OOP polarization disappears while the bulk-SnTe is thinned to a few layers. However, the complete OOP polarization recurs in monolayer SnTe/PbSe vdW heterostructures, which is due to the strong interface coupling. Our findings provide an effective way to enhance ferroelectric performance, which is beneficial for the design of ultra-thin ferroelectric devices.
由于非易失性存储器件的尺寸不断缩小,二维铁电范德华(vdW)异质结构受到了极大的关注。然而,要保持面外(OOP)铁电性仍然很困难。在这项工作中,我们通过第一性原理计算理论研究了 bulk 和 few-layer SnTe 的铁电性与应变之间的关系。结果表明,-SnTe 可以在应变范围为-6%到 6%之间稳定存在,而完整的 OOP 极化发生在应变范围为-4%到-2%之间。不幸的是,当 bulk-SnTe 减薄到几个原子层时,OOP 极化会消失。然而,在单层 SnTe/PbSe vdW 异质结构中,完整的 OOP 极化会重新出现,这是由于界面耦合很强。我们的发现为增强铁电性提供了一种有效的方法,这有利于超薄铁电器件的设计。