Department of Dermatology, Third Xiangya Hospital, Central South University, Changsha, China.
Center of Medical Laboratory Animal, Hunan Academy of Chinese Medicine, Changsha, China.
J Cell Physiol. 2023 Sep;238(9):2161-2171. doi: 10.1002/jcp.31077. Epub 2023 Jul 7.
Ultraviolet (UV) radiation is the primary exogenous inducer of skin pigmentation, although the mechanism has not been fully elucidated. N6-methyladenosine (m A) modification is one of the key epigenetic form of gene regulation that affects multiple biological processes. The aim of this study was to explore the role and underlying mechanisms of m A modification in UVB-induced melanogenesis. Low-dose UVB increased global m A modification in melanocytes (MCs) and MNT1 melanoma cell line. The GEPIA database predicted that methyltransferase METTL3 is positively correlated with the melanogenic transcription factor MITF in the sun-exposed skin tissues. After METTL3 respectively overexpressed and knocked down in the MNT1, the melanin content and melanogenesis-related genes were significantly upregulated after overexpression of METTL3, especially with UVB irradiation, and downregulated after METTL3 knockdown. METTL3 levels were also higher in melanocytic nevi with high melanin content. METTL3 overexpression and knockdown also altered the protein level of YAP1. SRAMP analysis predicted four high-potential m A modification sites on YAP1 mRNA, of which three were confirmed by methylated RNA immunoprecipitation. Inhibition of YAP1 expression can partially reverse melanogenesis induced by overexpression of METTL3. In conclusion, UVB irradiation promotes global m A modification in MCs and upregulates METTL3, which increases the expression level of YAP1 through m A modification, thereby activating the co-transcription factor TEAD1 and promoting melanogenesis.
紫外线(UV)辐射是皮肤色素沉着的主要外源性诱导因素,尽管其机制尚未完全阐明。N6-甲基腺苷(m A)修饰是影响多种生物学过程的关键基因调控表观遗传形式之一。本研究旨在探讨 m A 修饰在 UVB 诱导的黑素生成中的作用及其潜在机制。低剂量 UVB 增加了黑素细胞(MCs)和 MNT1 黑色素瘤细胞系中的全局 m A 修饰。GEPIA 数据库预测,在暴露于阳光的皮肤组织中,甲基转移酶 METTL3 与黑素生成转录因子 MITF 呈正相关。在 MNT1 中分别过表达和敲低 METTL3 后,METTL3 过表达后黑色素含量和黑素生成相关基因明显上调,尤其是在 UVB 照射后,METTL3 敲低后下调。黑色素含量高的黑素细胞痣中 METTL3 水平也较高。METTL3 的过表达和敲低也改变了 YAP1 的蛋白水平。SRAMP 分析预测了 YAP1 mRNA 上四个高潜力的 m A 修饰位点,其中三个通过甲基化 RNA 免疫沉淀得到证实。抑制 YAP1 表达可以部分逆转 METTL3 过表达诱导的黑素生成。总之,UVB 照射促进 MC 中的全局 m A 修饰,并上调 METTL3,通过 m A 修饰增加 YAP1 的表达水平,从而激活共转录因子 TEAD1 并促进黑素生成。