Bosse Florian, Gutheil Christian, Nguyen D Thao, Freitag Matthias, Das Mowpriya, Tyler Bonnie J, Adolphs Thorsten, Schäfer Andreas H, Arlinghaus Heinrich F, Glorius Frank, Ravoo Bart Jan
Organisch-Chemisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Corrensstraße 36, 48149 Münster, Germany.
Physikalisches Institut and Center for Soft Nanoscience Westfälische Wilhelms-Universität Münster Wilhelm-Klemm-Straße 10, 48149 Münster, Germany.
ACS Appl Mater Interfaces. 2023 Aug 2;15(30):36831-36838. doi: 10.1021/acsami.3c01046. Epub 2023 Jul 21.
N-Heterocyclic carbene (NHC)-modified planar gold surfaces (NHC@Au) were found to be more susceptible toward wet chemical etching than undecorated surface areas. Site-selective decoration of NHCs on Au was achieved by microcontact printing (μCP) of the NHC precursors 1,3-bis(diisopropylphenyl)imidazol-3-ium hydrogen carbonate (IPr(H)[HCO]) or 1,3-dimethylbenzimidazol-3-ium hydrogen carbonate (BIMe(H)[HCO]). Strikingly, BIMe@Au showed concentration-dependent etching behavior, tunable from a positive resist to a negative resist. Surface patterning was verified by time-of-flight secondary-ion mass spectrometry and Kelvin probe force microscopy. Moreover, orthogonal μCP enabled the patterned functionalization of planar Au with both IPr and 1-eicosanethiol and the subsequent formation of three-dimensional structures with a single etching step. The selective removal of Au by functionalization with a surface ligand is unprecedented and enables novel applications of NHCs in materials chemistry and nanofabrication.
已发现氮杂环卡宾(NHC)修饰的平面金表面(NHC@Au)比未修饰的表面区域更容易受到湿化学蚀刻的影响。通过对NHC前体1,3-双(二异丙基苯基)咪唑-3-鎓碳酸氢盐(IPr(H)[HCO])或1,3-二甲基苯并咪唑-3-鎓碳酸氢盐(BIMe(H)[HCO])进行微接触印刷(μCP),实现了NHC在金上的位点选择性修饰。引人注目的是,BIMe@Au表现出浓度依赖性蚀刻行为,可从正性抗蚀剂调节为负性抗蚀剂。通过飞行时间二次离子质谱和开尔文探针力显微镜对表面图案化进行了验证。此外,正交μCP能够用IPr和1-二十烷硫醇对平面金进行图案化功能化,并通过单一蚀刻步骤随后形成三维结构。通过表面配体功能化选择性去除金是前所未有的,并且使得NHC在材料化学和纳米制造中有了新的应用。