Gao Li'ao, Wu Hongjin, Dang Juan, Zhang Shibo, Tian Shuai, Zhang Qingzhu, Wang Wenxing
Environment Research Institute, Shandong University, Qingdao 266237, China.
Environment Research Institute, Shandong University, Qingdao 266237, China.
J Hazard Mater. 2023 Oct 5;459:132245. doi: 10.1016/j.jhazmat.2023.132245. Epub 2023 Aug 8.
Benzotriazole UV stabilizers (BT-UVs) are important UV absorbers. As high-production chemicals and potential hazards, their ubiquitous presence in aquatic environments is of greatly pressing concern. Herein, the removal of six typical BT-UVs by UV/HO was comprehensively investigated by quantum chemistry calculation integrated with CFD simulation. Utilizing such a micro and macro incorporated model in treating contaminants is the first report. From the micro-view, degradation mechanisms of BT-UVs by •OH oxidation were determined, and corresponding rate constants were obtained with values of 10∼10 Ms. In a macroscopic aspect, combining the established kinetic model and CFD simulation, the effects of UV lamp power (P), volumetric flow rate (Q), and HO dosage ([HO]) on removal yields of BT-UVs were expounded, increasing P or [HO] or decreasing Q are effective in improving removal yields of BT-UVs, but the enhancement was abated when P or [HO] increased to a certain level. When [HO] is 5 mg/L and Q is decreased from 0.1 to 0.05 m/h, the removal yields of BT-UVs could achieve more than 95% (P = 150 W) and 99% (P = 250 W), respectively. This work provides a new interdisciplinary insight for investigating organic contaminant removal in potential industrial applications of UV/HO systems.
苯并三唑类紫外线稳定剂(BT-UVs)是重要的紫外线吸收剂。作为高产量化学品和潜在危害物,它们在水生环境中的普遍存在引发了极为紧迫的关注。在此,通过量子化学计算结合计算流体力学(CFD)模拟,全面研究了UV/HO对六种典型BT-UVs的去除效果。利用这种微观与宏观相结合的模型处理污染物尚属首次报道。从微观角度确定了BT-UVs被•OH氧化的降解机理,并获得了相应的速率常数,其值为10∼10 M/s。从宏观方面来看,结合所建立的动力学模型和CFD模拟,阐述了紫外灯功率(P)、体积流量(Q)和HO投加量([HO])对BT-UVs去除率的影响,提高P或[HO]或降低Q均能有效提高BT-UVs的去除率,但当P或[HO]增加到一定水平时,这种增强作用会减弱。当[HO]为5 mg/L且Q从0.1 m³/h降至0.05 m³/h时,BT-UVs的去除率分别可达95%以上(P = 150 W)和99%(P = 250 W)。这项工作为研究UV/HO系统潜在工业应用中有机污染物的去除提供了一种新的跨学科视角。