Kim Yohan, Ko Jinyoung, Shim Minyoung, Park Jiwon, Shin Hyun-Hang, Kim Zee Hwan, Jung Yousung, Byon Hye Ryung
Department of Chemistry, Korea Advanced Institute of Science and Technology (KAIST) 291, Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea
Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu Daejeon 34141 Republic of Korea.
Chem Sci. 2024 Jan 12;15(7):2578-2585. doi: 10.1039/d3sc05793c. eCollection 2024 Feb 14.
Copper (Cu) is a widely used catalyst for the nitrate reduction reaction (NORR), but its susceptibility to surface oxidation and complex electrochemical conditions hinders the identification of active sites. Here, we employed electropolished metallic Cu with a predominant (100) surface and compared it to native oxide-covered Cu. The electropolished Cu surface rapidly oxidized after exposure to either air or electrolyte solutions. However, this oxide was reduced below 0.1 V RHE, thus returning to the metallic Cu before NORR. It was distinguished from the native oxide on Cu, which remained during NORR. Fast NO and NO reduction on the metallic Cu delivered 91.5 ± 3.7% faradaic efficiency for NH at -0.4 V RHE. In contrast, the native oxide on Cu formed undesired products and low NH yield. Operando shell-isolated nanoparticle-enhanced Raman spectroscopy (SHINERS) analysis revealed the adsorbed NO, NO, and NO species on the electropolished Cu as the intermediates of NH. Low overpotential NO and NO adsorptions and favorable NO reduction are key to increased NH productivity over Cu samples, which was consistent with the DFT calculation on Cu(100).
铜(Cu)是一种广泛用于硝酸盐还原反应(NORR)的催化剂,但其易受表面氧化和复杂电化学条件的影响,阻碍了活性位点的识别。在此,我们采用了具有主要(100)表面的电解抛光金属Cu,并将其与天然氧化物覆盖的Cu进行比较。电解抛光的Cu表面在暴露于空气或电解质溶液后迅速氧化。然而,这种氧化物在相对于可逆氢电极(RHE)为0.1 V以下时被还原,从而在NORR之前恢复为金属Cu。它与Cu上的天然氧化物不同,后者在NORR过程中仍然存在。在相对于RHE为-0.4 V时,金属Cu上快速的NO和NO还原反应产生了91.5±3.7%的NH法拉第效率。相比之下,Cu上的天然氧化物形成了不需要的产物且NH产率较低。原位壳层隔离纳米粒子增强拉曼光谱(SHINERS)分析揭示了在电解抛光的Cu上吸附的NO、NO和NO物种是NH的中间体。低过电位的NO和NO吸附以及有利的NO还原是提高Cu样品上NH生产率的关键,这与Cu(100)上的密度泛函理论(DFT)计算结果一致。