用于水净化的缺陷型锆基金属有机框架材料的功能化:对-NH和-SH位点在去除Hg(II)离子中竞争作用的机理洞察

Functionalization of Defective Zr-MOFs for Water Decontamination: Mechanistic Insight into the Competitive Roles of -NH and -SH Sites in the Removal of Hg(II) Ions.

作者信息

Sharifzadeh Zahra, Razavi Sayed Ali Akbar, Morsali Ali

机构信息

Department of Chemistry, Faculty of Sciences, Tarbiat Modares University, Tehran 14117-13116, Islamic Republic of Iran.

出版信息

ACS Appl Mater Interfaces. 2025 Mar 26;17(12):17726-17740. doi: 10.1021/acsami.3c15863. Epub 2024 Feb 20.

Abstract

Functional metal-organic frameworks (MOFs), especially those based on sulfur and nitrogen atoms, were frequently applied for the removal of Hg(II) ions. However, a systematic study on the cooperative or competitive roles of -SH and -NH functions in the presence of secondary mechanisms (proton transfer and redox) is still rare. In this work, the UiO-66 framework (Zr(OH)O(BDC), BDC = benzene-1,4-dicarboxylate) was decorated with functional monocarboxylate linkers including glycine (Gly), mercaptopropionic acid (Mer), and cysteine (Cys). Due to the molecular similarity of these functional linkers, the coordination affinity between the amine and thiol sites with Hg(II) ions can be compared, and the effect of proton transfer and redox mechanisms on the possible thiol···Hg(II) and amine···Hg(II) interactions can be investigated. The results show that the Cys@UiO-66 framework can adsorb 1288 mg g of Hg(II), while Mer@UiO-66 and Gly@UiO-66 can adsorb 593 and 313 mg g at pH = 7 and 500 ppm, respectively. This is due to the facts that both the amine and the thiol functions of the Cys@UiO-66 framework show synergism in Hg(II) removal, and the secondary mechanisms reduce the affinity of thiol in Mer@UiO-66 and amine in Gly@UiO-66 frameworks in the removal process of Hg(II) ions. Free -SH sites in Mer@UiO-66 undergo a redox convert to -SOH groups, and free protonated -NH sites in Gly@UiO-66 do not fully deprotonate during Hg(II) removal. Yet, in the case of Cys@UiO-66, free protonated -NH sites are fully deprotonated, and free SH sites did not convert to -SOH groups during Hg(II) removal. These observations show that the redox and proton transfer mechanisms can negatively affect the adsorption capacity of functional MOFs containing free -SH and -NH groups. So, not only the functionalization but also control over secondary mechanisms in the removal process are necessary parameters to improve the affinity between functional MOFs and Hg(II) ions.

摘要

功能性金属有机框架材料(MOFs),尤其是基于硫和氮原子的材料,常被用于去除汞离子(Hg(II))。然而,关于巯基(-SH)和氨基(-NH)官能团在存在次级机制(质子转移和氧化还原)时的协同或竞争作用的系统研究仍然很少。在这项工作中,UiO-66框架(Zr(OH)O(BDC),BDC = 对苯二甲酸)用包括甘氨酸(Gly)、巯基丙酸(Mer)和半胱氨酸(Cys)的功能性单羧酸连接体进行了修饰。由于这些功能性连接体的分子相似性,可以比较胺基和硫醇位点与汞离子(Hg(II))之间的配位亲和力,并研究质子转移和氧化还原机制对可能的硫醇···汞离子(Hg(II))和胺···汞离子(Hg(II))相互作用的影响。结果表明,在pH = 7和500 ppm时,Cys@UiO-66框架可以吸附1288 mg/g的汞离子(Hg(II)),而Mer@UiO-66和Gly@UiO-66分别可以吸附593和313 mg/g。这是因为Cys@UiO-66框架的胺基和硫醇官能团在去除汞离子(Hg(II))时都表现出协同作用,并且次级机制降低了Mer@UiO-66中的硫醇和Gly@UiO-66框架中的胺在汞离子(Hg(II))去除过程中的亲和力。Mer@UiO-66中的游离巯基(-SH)位点发生氧化还原转化为-SOH基团,而Gly@UiO-66中的游离质子化氨基(-NH)位点在汞离子(Hg(II))去除过程中没有完全去质子化。然而,在Cys@UiO-66的情况下,游离质子化氨基(-NH)位点完全去质子化,并且游离巯基(SH)位点在汞离子(Hg(II))去除过程中没有转化为-SOH基团。这些观察结果表明,氧化还原和质子转移机制会对含有游离巯基(-SH)和氨基(-NH)基团的功能性MOFs的吸附能力产生负面影响。因此,不仅功能化而且控制去除过程中的次级机制都是提高功能性MOFs与汞离子(Hg(II))之间亲和力的必要参数。

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