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铷锌铋和铯锌铋中的大间隙与拓扑晶体绝缘相

Large-Gap and Topological Crystalline Insulating Phase in RbZnBi and CsZnBi.

作者信息

Lee Hyunggeun, Han Myung Joon, Chang Kee Joo

机构信息

Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea.

出版信息

ACS Omega. 2024 Jun 24;9(27):29820-29828. doi: 10.1021/acsomega.4c03506. eCollection 2024 Jul 9.

Abstract

Topological insulators (TIs) are a new class of materials with gapless boundary states inside the bulk insulating gap. This metallic boundary state hosts intriguing phenomena such as helical spin textures and Dirac crossing points. Here, we theoretically propose RbZnBi and CsZnBi as a new family of TIs exhibiting large bulk band gaps and unique gapless surface states. Our first-principles density functional calculations show that two materials can be stabilized in two different structures depending on the stacking order of hexagonal ZnBi layers. While both materials in the AA-stacked structure become TI, the AB-stacked RbZnBi and CsZnBi are topological crystalline insulators with hourglass-shaped Fermion surface states protected by nonsymmorphic glide symmetry. The calculated bulk gap is about 1.5-1.8 times larger than that of BiSe, which makes RbZnBi and CsZnBi promising candidates for future applications.

摘要

拓扑绝缘体(TIs)是一类新型材料,在其体绝缘能隙内具有无隙边界态。这种金属边界态呈现出诸如螺旋自旋纹理和狄拉克交叉点等有趣现象。在此,我们从理论上提出RbZnBi和CsZnBi作为一类新型的拓扑绝缘体,它们具有大的体带隙和独特的无隙表面态。我们的第一性原理密度泛函计算表明,根据六方ZnBi层的堆叠顺序,这两种材料可以稳定在两种不同的结构中。虽然AA堆叠结构中的两种材料都成为拓扑绝缘体,但AB堆叠的RbZnBi和CsZnBi是具有由非对称滑移对称性保护的沙漏形费米子表面态的拓扑晶体绝缘体。计算得到的体带隙比BiSe的体带隙大约1.5 - 1.8倍,这使得RbZnBi和CsZnBi成为未来应用的有前途的候选材料。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/626f/11238197/052ddd535b39/ao4c03506_0001.jpg

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