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纳米尺度下作为润滑剂的分子:利用溶剂蒸汽退火实现从纳米到毫米尺度有机结构的可调生长。

Molecules as Lubricants at the Nanoscale:Tunable Growth of Organic Structures from Nano- to Millimeter-Scale Using Solvent Vapour Annealing.

作者信息

Benekou Vasiliki, Candini Andrea, Liscio Andrea, Palermo Vincenzo

机构信息

Institute for Organic Synthesis and Photoreactivity, National Research Council of Italy, Via Gobetti 101, 40129, Bologna, Italy.

Institute for Microelectronics and Microsystems - Rome Unit, National Research Council of Italy, Via del Fosso del Cavaliere 100, 00133, Rome, Italy.

出版信息

Chempluschem. 2024 Dec;89(12):e202400133. doi: 10.1002/cplu.202400133. Epub 2024 Oct 24.

DOI:10.1002/cplu.202400133
PMID:39185588
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11639633/
Abstract

The creation of ordered structures of molecules assembled from solution onto a substrate is a fundamental technological necessity across various disciplines, spanning from crystallography to organic electronics. However, achieving macroscopic order poses significant challenges, since the process of deposition is inherently impacted by factors like solvent evaporation and dewetting flows, which hinder the formation of well-organized structures. Traditional methods like drop casting or spin coating encounter limitations due to the rapid kinetics of solvent evaporation, leading to limited control over final uniformity and order. In response to these challenges, Solvent Vapour Annealing (SVA) has emerged as a promising solution for realizing ordered molecular structures at scales ranging from nano- to milli- meters. SVA decouples the self-assembly stage from the deposition stage by utilizing solvent vapours which can enable rearrangement, movement, and diffusion of large molecules on the surface even on a macroscopic scale. Essentially acting as "molecular lubricants," solvent vapours enable the formation of well-ordered molecular films. This review discusses the advancements, obstacles, and promising strategies associated with utilizing SVA for the development of innovative nanostructured thin films, and emphasizes the originality and effectiveness of molecular assembly on substrates achieved through this approach.

摘要

从溶液中组装到基底上形成分子有序结构是从晶体学到有机电子学等各个学科的一项基本技术需求。然而,实现宏观有序面临重大挑战,因为沉积过程本质上受到溶剂蒸发和去湿流等因素的影响,这些因素阻碍了有序结构的形成。像滴铸或旋涂这样的传统方法由于溶剂蒸发的快速动力学而受到限制,导致对最终均匀性和有序性的控制有限。为应对这些挑战,溶剂蒸汽退火(SVA)已成为一种有前景的解决方案,用于在从纳米到毫米的尺度上实现有序分子结构。SVA通过利用溶剂蒸汽将自组装阶段与沉积阶段分离,这甚至在宏观尺度上也能使大分子在表面重新排列、移动和扩散。溶剂蒸汽本质上充当“分子润滑剂”,能够形成有序的分子膜。本综述讨论了与利用SVA开发创新纳米结构薄膜相关的进展、障碍和有前景的策略,并强调了通过这种方法在基底上实现分子组装的创新性和有效性。

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