Zhong Shulin, Zhang Xuanlin, Gou Jian, Chen Lan, Wei Su-Huai, Yang Shengyuan A, Lu Yunhao
School of Physics, Zhejiang University, Hangzhou, 310027, China.
State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science & Engineering, Zhejiang University, Hangzhou, 310027, China.
Nat Commun. 2024 Sep 27;15(1):8322. doi: 10.1038/s41467-024-52643-5.
Ferroelectricity has been predicted in two-dimensional Group-Va elemental materials and confirmed in high-quality Bi monolayers by a recent experiment. The origin of such elemental ferroelectricity is related to the spontaneous lattice distortion with atomic layer buckling. A surprising observation in experiment is the abundance of charged 180° head-to-head/tail-to-tail domain walls, distinct from conventional ferroelectrics, where the naturally occurring ferroelectric domain walls are mostly charge neutral. Here, we clarify the origin of this phenomenon. We find that distinct from conventional ferroelectrics, in such single-element ferroelectric monolayers, it is the strain energy rather than the electrostatic energy that dominates the energetics. This leads to intrinsically stable 180° charged domain walls. The orbital interaction and the lone-pair activation mechanism play a key role in this picture. We further predict and confirm experimentally that the most stable domain wall type changes from charged to neutral ones under small applied strain. Our work reveals a mechanism to generate polarization and stabilize intrinsic charged domain walls, which will shed light on potential applications of ferroelectronics based on charged domain walls.
二维第VA族元素材料中已预测存在铁电性,并且最近的一项实验在高质量铋单分子层中证实了这一点。这种元素铁电性的起源与原子层屈曲引起的自发晶格畸变有关。实验中一个令人惊讶的发现是大量带电的180°头对头/尾对尾畴壁,这与传统铁电体不同,传统铁电体中自然形成的铁电畴壁大多是电荷中性的。在此,我们阐明了这一现象的起源。我们发现,与传统铁电体不同,在这种单元素铁电单分子层中,主导能量学的是应变能而非静电能。这导致了本质上稳定的180°带电畴壁。轨道相互作用和孤对激活机制在这一过程中起关键作用。我们进一步预测并通过实验证实,在小的外加应变下,最稳定的畴壁类型会从带电变为中性。我们的工作揭示了一种产生极化并稳定固有带电畴壁的机制,这将为基于带电畴壁的铁电电子学的潜在应用提供启示。