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用于低维材料和异质结构的光谱椭偏仪。

Spectroscopic ellipsometry for low-dimensional materials and heterostructures.

作者信息

Yoo SeokJae, Park Q-Han

机构信息

Department of Physics, Inha University, Incheon 22212, Korea.

Department of Physics, Korea University, Seoul 02841, Korea.

出版信息

Nanophotonics. 2022 Apr 18;11(12):2811-2825. doi: 10.1515/nanoph-2022-0039. eCollection 2022 Jun.

Abstract

Discovery of low-dimensional materials has been of great interest in physics and material science. Optical permittivity is an optical fingerprint of material electronic structures, and thus it is an important parameter in the study of the properties of materials. Spectroscopic ellipsometry provides a fast, robust, and noninvasive method for obtaining the optical permittivity spectra of newly discovered materials. Atomically thin low-dimensional materials have an extremely short vertical optical path length inside them, making the spectroscopic ellipsometry of low-dimensional materials unique, compared to traditional ellipsometry. Here, we introduce the fundamentals of spectroscopic ellipsometry for two-dimensional (2D) materials and review recent progress. We also discuss technical challenges and future directions in spectroscopic ellipsometry for low-dimensional materials.

摘要

低维材料的发现一直是物理学和材料科学领域的研究热点。光学介电常数是材料电子结构的光学指纹,因此是研究材料性质的一个重要参数。光谱椭偏仪为获取新发现材料的光学介电常数光谱提供了一种快速、可靠且非侵入性的方法。原子级薄的低维材料内部具有极短的垂直光程长度,这使得与传统椭偏仪相比,低维材料的光谱椭偏测量具有独特性。在此,我们介绍二维(2D)材料光谱椭偏测量的基本原理,并综述近期进展。我们还讨论了低维材料光谱椭偏测量中的技术挑战和未来发展方向。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a0e2/11501394/2adba339cdef/j_nanoph-2022-0039_fig_001.jpg

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