Jiang Chun-Sheng, Farshchi Rouin, Nagle Timothy, Lu Dingyuan, Xiong Gang, Mansfield Lorelle M, Reese Matthew O
National Renewable Energy Laboratory, Golden, Colorado 80401, United States.
California Technology Center, First Solar Inc, Santa Clara, California 95050, United States.
ACS Appl Mater Interfaces. 2025 Jan 15;17(2):3278-3288. doi: 10.1021/acsami.4c15741. Epub 2025 Jan 6.
Optimizing group-V doping and Se alloying are two main focuses for advancing CdTe photovoltaic technology. We report on nanometer-scale characterizations of microelectronic structures of phosphorus (P)-doped CdSeTe devices using a combination of two atomic force microscopy-based techniques, namely, Kelvin probe force microscopy (KPFM) and scanning spreading resistance microscopy (SSRM). KPFM on device cross-section images distribution of the potential drop across the device. SSRM taken on a delaminated front interface and further beveling into absorber bulk reveals local distributions of doping polarity and carrier concentration. The KPFM and SSRM imaging corroborate each other, suggesting that nonuniform doping revealed by SSRM is associated with nonuniform potential features observed by KPFM. These detrimental microelectronic structures were improved by enhancing P-doping. The large nonuniform potential drop and deep overall n-p transition in the device without doping were mitigated to potential fluctuation around the front interface and n-p transition depth of ∼100 nm by low-level P-doping and further mitigated to scarce and slight irregular potential and p-weighed doping at the interface by high-level P-doping. These characterizations imply sophisticated defect chemistry, atomic structure, and associated electronic structure in CdTe with Se alloying and group-V doping together and further point to the direction for improving device efficiency by mitigating and ultimately eliminating the nonuniform doping and irregular potential.
优化V族元素掺杂和硒合金化是推动碲化镉光伏技术发展的两个主要重点。我们报告了使用基于原子力显微镜的两种技术,即开尔文探针力显微镜(KPFM)和扫描扩展电阻显微镜(SSRM),对磷(P)掺杂的CdSeTe器件的微电子结构进行纳米级表征。KPFM用于器件横截面图像,显示器件上电位降的分布。在分层的前界面上进行SSRM,并进一步斜切进入吸收体本体,揭示了掺杂极性和载流子浓度的局部分布。KPFM和SSRM成像相互印证,表明SSRM揭示的不均匀掺杂与KPFM观察到的不均匀电位特征有关。通过增强P掺杂改善了这些有害的微电子结构。未掺杂器件中较大的不均匀电位降和较深的整体n-p转变,通过低水平P掺杂减轻为前界面周围的电位波动和n-p转变深度约为100nm,通过高水平P掺杂进一步减轻为界面处稀少且轻微不规则的电位和p型加权掺杂。这些表征意味着碲化镉中复杂的缺陷化学、原子结构以及与硒合金化和V族元素掺杂相关的电子结构,并进一步指出了通过减轻并最终消除不均匀掺杂和不规则电位来提高器件效率的方向。