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一种新型一氧化氮(NO)释放剂:FK409的自发NO释放

A new nitric oxide (NO) releaser: spontaneous NO release from FK409.

作者信息

Fukuyama S, Kita Y, Hirasawa Y, Azuma T, Sato A, Morokoshi N, Koda S, Yasuda T, Oka S, Sakurai H

机构信息

Analytical Research Laboratories, Fujisawa Pharmaceutical Co., Ltd., Osaka, Japan.

出版信息

Free Radic Res. 1995 Nov;23(5):443-52. doi: 10.3109/10715769509065265.

Abstract

The remarkable vasorelaxant and anti-platelet effects of FK409 have been reported to be due to nitric oxide (NO) release. The purpose of the present study is to investigate the spontaneous NO-releasing pathway of FK409 in aqueous solutions. 1H-NMR spectra of FK409 suggested that the compound underwent a time-dependent elimination of the hydrogen atom at alpha-position of the nitro moiety (at the 5-position) in weakly alkaline solutions. In addition, the degradation of FK409 monitored by HPLC showed a pH-dependency accelerating with an increase of pH. These results revealed that the first step in the degradation of FK409 might be the hydroxyl ion-dependent subtraction of the hydrogen atom at the 5-position. On the other hand, NO release from FK409 also exhibited a pH-dependency, and the velocity of NO liberation was markedly enhanced above pH 6. Furthermore, a linear relationship between the rate of FK409 degradation and that of NO formation was observed, indicating that the rate-limiting step for NO formation is the same as that for degradation. Thus, the rate-limiting process of NO formation from FK409 is due to the deprotonation reaction of the hydrogen atom at the 5-position by hydroxyl ions. The deprotonation process appears to be an essential step for both FK409 degradation and NO release. On the basis of the results, a possible kinetic scheme for NO release from FK409 is proposed.

摘要

据报道,FK409显著的血管舒张和抗血小板作用归因于一氧化氮(NO)的释放。本研究的目的是探究FK409在水溶液中的自发NO释放途径。FK409的1H-NMR光谱表明,该化合物在弱碱性溶液中会随时间消除硝基部分(5位)α位的氢原子。此外,通过HPLC监测的FK409降解显示出pH依赖性,随着pH升高而加速。这些结果表明,FK409降解的第一步可能是5位氢原子的羟基离子依赖性消除。另一方面,FK409释放NO也表现出pH依赖性,并且在pH 6以上,NO释放速度明显加快。此外,观察到FK409降解速率与NO形成速率之间存在线性关系,表明NO形成的限速步骤与降解的限速步骤相同。因此,FK409形成NO的限速过程是由于5位氢原子被羟基离子去质子化反应。去质子化过程似乎是FK409降解和NO释放的关键步骤。基于这些结果,提出了FK409释放NO的可能动力学方案。

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