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精神分裂症和躁狂症中的逆向掩蔽。I. 明确一种机制。

Backward masking in schizophrenia and mania. I. Specifying a mechanism.

作者信息

Green M F, Nuechterlein K H, Mintz J

机构信息

Department of Psychiatry and Biobehavioral Sciences, University of California, Los Angeles.

出版信息

Arch Gen Psychiatry. 1994 Dec;51(12):939-44. doi: 10.1001/archpsyc.1994.03950120011003.

Abstract

BACKGROUND

Backward masking is a neuropsychological procedure that involves the earliest phases of visual processing. Compared with normal controls, the performance of schizophrenic patients is more disrupted by a visual mask. Masking procedures used previously with schizophrenic patients have combined two separate masking mechanisms (interruption and integration), which prevent interpretation of the nature of the abnormality. The current study systematically limited the masking mechanism to interruption to specify the underlying mechanisms. Manic patients were included to examine diagnostic specificity.

METHODS

Sixty-three schizophrenic inpatients, 31 manic inpatients, and 48 normal controls received three versions of the backward masking procedure. One version used a high-energy mask that combines both integration and interruption mechanisms. Another procedure used a low-energy mask that works mainly through interruption. A final condition altered the features of the mask so that masking was almost entirely through interruption.

RESULTS

Schizophrenic patients showed performance deficits across masking conditions, even in procedures that were largely limited to masking by interruption. The masking performance of the patients did not appear to fit a simple generalized deficit. Manic patients performed significantly worse than normal controls and comparably with the schizophrenic patients.

CONCLUSIONS

Schizophrenic patients have abnormalities at least with interruptive mechanisms. The results suggest that deficits on masking procedures are not entirely specific to schizophrenia because comparable masking deficits were found in manic inpatients with chronic disease. The current study addresses the neuropsychological mechanisms of the masking deficit. The next step will be to investigate the contributions of two distinct neuroanatomical visual pathways to the masking abnormality in schizophrenia.

摘要

背景

逆向掩蔽是一种涉及视觉处理早期阶段的神经心理学程序。与正常对照组相比,精神分裂症患者的表现更容易受到视觉掩蔽的干扰。先前用于精神分裂症患者的掩蔽程序结合了两种不同的掩蔽机制(中断和整合),这妨碍了对异常性质的解释。当前研究系统地将掩蔽机制限制为中断,以明确潜在机制。纳入躁狂症患者以检验诊断特异性。

方法

63名精神分裂症住院患者、31名躁狂症住院患者和48名正常对照者接受了三个版本的逆向掩蔽程序。一个版本使用结合了整合和中断机制的高能掩蔽。另一个程序使用主要通过中断起作用的低能掩蔽。最后一种情况改变了掩蔽的特征,使得掩蔽几乎完全通过中断进行。

结果

精神分裂症患者在各种掩蔽条件下均表现出功能缺陷,即使在很大程度上仅限于通过中断进行掩蔽的程序中也是如此。患者的掩蔽表现似乎不符合简单的普遍性缺陷。躁狂症患者的表现明显比正常对照者差,与精神分裂症患者相当。

结论

精神分裂症患者至少在中断机制方面存在异常。结果表明,掩蔽程序上的缺陷并非精神分裂症所特有,因为在患有慢性疾病的躁狂症住院患者中也发现了类似的掩蔽缺陷。当前研究探讨了掩蔽缺陷背后的神经心理学机制。下一步将是研究两条不同的神经解剖学视觉通路对精神分裂症掩蔽异常的作用。

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