Han J S
Department of Natural Medicinals and Biologics, Korean Food and Drug Administration, Seoul, South Korea.
Mutat Res. 1997 Mar 21;374(2):169-84. doi: 10.1016/s0027-5107(96)00207-2.
In the ad-3 forward-mutation test, hydrogen peroxide was at best a weak mutagen in nongrowing conidia from a DNA repair-proficient heterokaryon (H-12, uvs-2+/uvs-2+) but was a moderate mutagen in nongrowing conidia from a DNA-repair-deficient heterokaryon (H-59, uvs-2/uvs-2) over a narrow range of high concentrations. H-59 also was more sensitive than H-12 to the killing activity of hydrogen peroxide at high concentrations. Thus, a DNA-repair pathway, of which the gene product of the uvs-2+ allele is a part, appears to be involved in the repair of hydrogen peroxide-induced DNA lesions at low survival in these strains. There was slightly, but significantly, more killing by hydrogen peroxide of nongrowing conidia from H-12 and H-59 in the presence of O2 than in the absence of O2 (presence of N2). Thus, the killing activity of hydrogen peroxide was enhanced by O2. The Mutational Spectra of hydrogen peroxide-induced ad-3 mutants shows that hydrogen peroxide induced mainly gene/point mutations but also some multilocus deletion mutations in H-12 and H-59. Multiple-locus mutations occurred only in H-59, but the frequency was very low. The frequencies of the 3 kinds of intracistronic complementation pattern among ad-3BR mutants (gene/point mutations) suggest that hydrogen peroxide induced both base-pair substitutions and frameshift mutations in both strains.
在ad - 3正向突变试验中,过氧化氢对于来自DNA修复能力正常的异核体(H - 12,uvs - 2⁺/uvs - 2⁺)的非生长型分生孢子而言,充其量只是一种弱诱变剂;但在高浓度范围较窄时,对于来自DNA修复缺陷的异核体(H - 59,uvs - 2/uvs - 2)的非生长型分生孢子却是一种中度诱变剂。H - 59对高浓度过氧化氢的杀伤活性也比H - 12更敏感。因此,uvs - 2⁺等位基因的基因产物所属的一种DNA修复途径,似乎参与了这些菌株在低存活率情况下对过氧化氢诱导的DNA损伤的修复。在有O₂存在时,H - 12和H - 59的非生长型分生孢子被过氧化氢杀伤的程度比在无O₂(有N₂)时略高,但差异显著。因此,O₂增强了过氧化氢的杀伤活性。过氧化氢诱导的ad - 3突变体的突变谱表明,过氧化氢在H - 12和H - 59中主要诱导基因/点突变,但也诱导了一些多位点缺失突变。多位点突变仅发生在H - 59中,但其频率非常低。ad - 3BR突变体(基因/点突变)中3种顺反子内互补模式的频率表明,过氧化氢在这两种菌株中均诱导了碱基对替换和移码突变。