Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition.

作者信息

Tsu DV, Lucovsky G, Mantini MJ

出版信息

Phys Rev B Condens Matter. 1986 May 15;33(10):7069-7076. doi: 10.1103/physrevb.33.7069.

DOI:10.1103/physrevb.33.7069

PMID:9938035

Abstract

摘要

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