Schuurmans FJ, Vanmaekelbergh D, Lagendijk A
Van der Waals-Zeeman Instituut, Universiteit van Amsterdam, Valckenierstraat 65, 1018 XE Amsterdam, The Netherlands. Debye Instituut, Universiteit Utrecht, Post Office Box 80000, 3508 TA Utrecht, The Netherlands.
Science. 1999 Apr 2;284(5411):141-3. doi: 10.1126/science.284.5411.141.
A photo-assisted electrochemical etching technique to fabricate macropores in single-crystalline gallium phosphide (GaP) with variable porosity has been developed. Scanning electron microscopy and x-ray diffraction experiments confirm that the material consists of three-dimensional, interconnected random networks with pore sizes of about 150 nanometers. Optical transmission measurements demonstrate that the nonabsorbing disordered structures strongly scatter light. The photonic strength is controlled by filling the pores with liquids of different refractive indices. Macroporous gallium phosphide filled with air has the highest scattering efficiency for visible light.
已开发出一种光辅助电化学蚀刻技术，用于在具有可变孔隙率的单晶磷化镓（GaP）中制造大孔。扫描电子显微镜和X射线衍射实验证实，该材料由三维相互连接的随机网络组成，孔径约为150纳米。光透射测量表明，非吸收性无序结构强烈散射光。通过用不同折射率的液体填充孔隙来控制光子强度。填充空气的大孔磷化镓对可见光具有最高的散射效率。
