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化学气相沉积二氧化钛/硅胶的结构

Structure of Chemical Vapor Deposition Titania/Silica Gel.

作者信息

Leboda R, Gun'ko VM, Marciniak M, Malygin AA, Malkin AA, Grzegorczyk W, Trznadel BJ, Pakhlov EM, Voronin EF

机构信息

Faculty of Chemistry, Maria Curie-Sklodowska University, Lublin, 20031, Poland

出版信息

J Colloid Interface Sci. 1999 Oct 1;218(1):23-39. doi: 10.1006/jcis.1999.6411.

Abstract

The structure of porous silica gel/titania synthesized using chemical vapor deposition (CVD) of titania via repeated reactions of TiCl(4) with the surface and subsequent hydrolysis of residual Ti-Cl bonds at different temperatures was investigated by means of low-temperature nitrogen adsorption-desorption, X-ray diffraction (XRD), IR spectroscopy, and theoretical methods. A globular model of porous solids with corpuscular structure was applied to estimate the porosity parameters of titania/silica gel adsorbents. The utilization of this model is useful, for example, to predict conditions for synthesis of titania/silica with a specified structure. Analysis of pore parameters and fractal dimension suggests that the porosity and fractality of samples decrease with increasing amount of TiO(2) covering the silica gel surface in a nonuniform layer, which represents small particles embedded in pores and larger particles formed at the outer surface of silica globules. Theoretical simulation shows that the Si-O-Ti linkages between the cover and the substrate can be easily hydrolyzed, which is in agreement with the IR data corresponding to the absence of a band at 950 cm(-1) (characteristic of Si-O-Ti bridges) independent of the concentration of CVD-titania. Copyright 1999 Academic Press.

摘要

通过低温氮吸附-脱附、X射线衍射(XRD)、红外光谱和理论方法,研究了利用四氯化钛与表面的重复反应以及随后在不同温度下残余Ti-Cl键的水解,通过化学气相沉积(CVD)法合成的多孔硅胶/二氧化钛的结构。应用具有微粒结构的多孔固体球状模型来估算二氧化钛/硅胶吸附剂的孔隙率参数。例如,该模型的应用有助于预测合成具有特定结构的二氧化钛/二氧化硅的条件。孔隙参数和分形维数分析表明,随着二氧化钛以不均匀层覆盖硅胶表面的量增加,样品的孔隙率和分形性降低,这表现为嵌入孔隙中的小颗粒和在硅胶球外表面形成的较大颗粒。理论模拟表明,覆盖层与基底之间的Si-O-Ti键很容易水解,这与对应于950 cm⁻¹处无谱带(Si-O-Ti桥的特征)的红外数据一致,且该谱带与CVD二氧化钛的浓度无关。版权所有1999年学术出版社。

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