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薄膜分层过程中出现起伏状水疱。

Undulated blistering during thin film delamination.

作者信息

Peyla P

机构信息

Physics Department, Rutherford Building, McGill University, 3600 rue University, Montreal, Quebec, Canada H3A 2T8 and Groupe de Recherche sur les Phenomenes Hors Equilibre (GREPHE), Laboratoire de Spectrometrie Physique, Universite Joseph Fo.

出版信息

Phys Rev E Stat Phys Plasmas Fluids Relat Interdiscip Topics. 2000 Aug;62(2 Pt A):R1501-4. doi: 10.1103/physreve.62.r1501.

Abstract

We study the delamination of a compressed thin film from a solid substrate with continuum elasticity theory. Our model enables one to describe the advance of an undulated blister. It is shown that an elastic tension between the inner fold and the boundary of a blister is at the origin of the undulations. In addition, the essential experimental observations and recent simulations are reproduced very well: (i) Above a strain threshold, straight blister growth is unstable and starts to undulate. (ii) It is found that the period of the undulations scales with epsilon(-1/2), where epsilon() is the isotropic compressive strain of the film. (iii) Similar periodic corrections to this power law scaling are recovered and are found to be associated with a growth instability.

摘要

我们运用连续介质弹性理论研究压缩薄膜与固体基底之间的分层现象。我们的模型能够描述起伏水泡的推进过程。结果表明,水泡内部褶皱与边界之间的弹性张力是起伏现象的根源。此外,该模型还很好地再现了重要的实验观测结果和近期的模拟结果:(i)在应变阈值之上,直水泡的生长是不稳定的,开始出现起伏。(ii)发现起伏的周期与ε*(-1/2)成比例,其中ε*是薄膜的各向同性压缩应变。(iii)恢复了对该幂律标度的类似周期性修正,并发现其与生长不稳定性有关。

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