Narhe R D, Khandkar M D, Adhi K P, Limaye A V, Sainkar S R, Ogale S B
Department of Physics, University of Pune, Pune 411 007, India.
Phys Rev Lett. 2001 Feb 19;86(8):1570-3. doi: 10.1103/PhysRevLett.86.1570.
Dynamic scaling behavior of the droplet size distribution in the coalescence regime for growth by pulsed laser deposition is studied experimentally and by computer simulation, and the same is compared with that for continuous vapor deposition. The scaling exponent for pulsed deposition is found to be (1.2 +/- 0.1), which is significantly lower as compared to that for continuous deposition (1.6 +/- 0.1). Simulations reveal that this dramatic difference can be traced to the large fraction of multiple droplet coalescence under pulsed vapor delivery. A possible role of the differing diffusion fields in the two cases is also suggested.
