Wang J Y, Betelu S, Law B M
Condensed Matter Laboratory, Department of Physics, Kansas State University, Manhattan, Kansas 66506, USA.
Phys Rev E Stat Nonlin Soft Matter Phys. 2001 Mar;63(3 Pt 1):031601. doi: 10.1103/PhysRevE.63.031601. Epub 2001 Feb 21.
The line tension values of n-octane and 1-octene on a hexadecyltrichlorosilane coated silicon wafer, are determined by contact angle measurements at temperatures near a first-order wetting transition T(w). It is shown experimentally that the line tension changes sign as the temperature increases toward T(w) in agreement with a number of theoretical predictions. A simple phenomenological model possessing a repulsive barrier at l(0)=5.1+/-0.2 nm and a scale factor of B=78+/-6 provides a quantitative description of the experiments.
通过在接近一级润湿转变温度T(w)的温度下进行接触角测量，测定了正辛烷和1-辛烯在十六烷基三氯硅烷涂层硅片上的线张力值。实验表明，随着温度向T(w)升高，线张力的符号发生变化，这与一些理论预测一致。一个简单的唯象模型在l(0)=5.1±0.2 nm处具有排斥势垒，比例因子B = 78±6，该模型对实验进行了定量描述。
