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电场对铁电和反铁电液晶器件近晶层结构的影响。

Influence of electric fields on the smectic layer structure of ferroelectric and antiferroelectric liquid crystal devices.

作者信息

Watson S J, Matkin L S, Baylis L J, Bowring N, Gleeson H F, Hird M, Goodby J

机构信息

Department of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom.

出版信息

Phys Rev E Stat Nonlin Soft Matter Phys. 2002 Mar;65(3 Pt 1):031705. doi: 10.1103/PhysRevE.65.031705. Epub 2002 Feb 11.

Abstract

The electric-field-induced structural rearrangement of smectic layers in the antiferroelectric and ferroelectric phases of three different materials is reported. The materials all have high optical tilt angles (around 30 degrees ), compared with the steric tilt angles deduced from layer spacing measurements (around 18 degrees ). The chevron angles observed in devices agree well with values found for the steric tilt angle across the tilted mesophase range. Electric fields were applied to liquid crystal devices while the smectic layer structures, in both the depth and in the plane of the device, were probed using small angle x-ray scattering. Two separate aspects of the influence of the field on the layer structure were studied. First, the organization of the smectic layers in the antiferroelectric phase is described before, during, and after the application of an electric field of sufficient magnitude to induce a chevron to bookshelf transition. Second, the evolution of the field-induced layer structure change has been investigated as the field was incrementally increased in both the antiferroelectric and ferroelectric phases. It was found that the chevron to bookshelf transition has a distinct threshold in the antiferroelectric phase, but shows low or zero threshold behavior in the ferroelectric phase for all the materials studied.

摘要

报道了三种不同材料在反铁电相和铁电相中介晶层的电场诱导结构重排。与根据层间距测量推导的空间倾斜角(约18度)相比,这些材料都具有较高的光学倾斜角(约30度)。在器件中观察到的V形角与在倾斜中间相范围内发现的空间倾斜角值吻合良好。在向液晶器件施加电场时,使用小角X射线散射探测了器件深度和平面内的近晶层结构。研究了电场对层结构影响的两个不同方面。第一,描述了在施加足以诱导V形向书架状转变的电场之前、期间和之后反铁电相中近晶层的排列。第二,研究了在反铁电相和铁电相中电场逐渐增加时场致层结构变化的演变。结果发现,V形向书架状转变在反铁电相中具有明显的阈值,但在所研究的所有材料的铁电相中表现出低阈值或零阈值行为。

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