Kong K, Han M, Yeom H W, Miyamoto Y, Sugino O, Sasaki T, Ohno T, Yu B D
IQUIPS, University of Seoul, 90 Jeonnong-dong, Dongdaemun-gu, Seoul 130-743, Korea.
Phys Rev Lett. 2002 Mar 25;88(12):125504. doi: 10.1103/PhysRevLett.88.125504. Epub 2002 Mar 7.
By carrying out first-principles calculations on diamond-forming processes, we predict a method for the heteroepitaxial growth of diamond on cubic beta-SiC(001). In the method, we used two processes: (i) the preformation of an sp(3)-like surface configuration of beta-SiC(001) by the adsorption of group-V surfactants; (ii) the successive growth of diamond by the segregation of the surfactants onto a surface and the desorption of surface hydrogen. Analyzing the segregation energies, we found that the atomic size effect plays a crucial role in the surfactant-mediated growth of diamond on beta-SiC(001).
通过对金刚石形成过程进行第一性原理计算,我们预测了一种在立方β-SiC(001)上异质外延生长金刚石的方法。在该方法中,我们采用了两个过程:(i) 通过吸附第V族表面活性剂形成β-SiC(001)的类sp(3)表面构型;(ii) 通过表面活性剂在表面的偏析和表面氢的脱附来连续生长金刚石。分析偏析能后,我们发现原子尺寸效应在表面活性剂介导的金刚石在β-SiC(001)上的生长中起着关键作用。