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外延NdNiO3薄膜中电荷序的直接观测

Direct observation of charge order in an epitaxial NdNiO3 film.

作者信息

Staub U, Meijer G I, Fauth F, Allenspach R, Bednorz J G, Karpinski J, Kazakov S M, Paolasini L, d'Acapito F

机构信息

Swiss Light Source, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland.

出版信息

Phys Rev Lett. 2002 Mar 25;88(12):126402. doi: 10.1103/PhysRevLett.88.126402. Epub 2002 Mar 8.

Abstract

The first direct observation of charge order of Ni(3+delta(')) and Ni(3-delta) by resonant x-ray scattering experiments in an epitaxial film of NdNiO3 is reported. A quantitative value of delta+delta(') = (0.45 +/- 0.04)e was obtained. The temperature dependence of the charge order deviates significantly from those of the magnetic moment and crystallographic structure. This might be an indication of a difference in their fluctuation time scales. These observations are discussed in terms of the temperature-driven metal-insulator transition in the RNiO3 family.

摘要

报道了通过共振X射线散射实验在NdNiO3外延薄膜中对Ni(3+δ')和Ni(3-δ)电荷序的首次直接观测。得到了δ+δ'=(0.45±0.04)e的定量值。电荷序的温度依赖性与磁矩和晶体结构的温度依赖性有显著偏差。这可能表明它们的涨落时间尺度存在差异。根据RNiO3族中温度驱动的金属-绝缘体转变对这些观测结果进行了讨论。

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