Gnecco E, Bennewitz R, Meyer E
Institute of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland.
Phys Rev Lett. 2002 May 27;88(21):215501. doi: 10.1103/PhysRevLett.88.215501. Epub 2002 May 8.
A scanning force microscope in ultrahigh vacuum has been used to realize and detect atomic-scale abrasion on KBr(001). The continuous time evolution of the lateral force under scratching reveals that the wear mechanism is due to the removal and the rearrangement of single ion pairs. The debris is reorganized in regular terraces with the same periodicity and orientation as the unscratched surface, as in local epitaxial growth. The applied load has a strong influence on the abrasive process, whereas the scan velocity is less relevant.
超高真空中的扫描力显微镜已被用于实现和检测KBr(001)表面的原子尺度磨损。划痕过程中侧向力的连续时间演化表明，磨损机制是由于单个离子对的去除和重新排列。碎片重新组织成规则的平台，其周期性和取向与未划伤表面相同，如同局部外延生长。施加的载荷对磨损过程有很大影响，而扫描速度的影响较小。
