Buskühl Martin, Korte Ernst-Heiner
Institut für Spektrochemie und Angewandte Spektroskopie, Albert-Einstein-Str 9, 12489 Berlin-Adlershof, Germany.
Anal Bioanal Chem. 2002 Oct;374(4):672-5. doi: 10.1007/s00216-002-1449-x. Epub 2002 Aug 17.
Spectroscopic infrared ellipsometry was applied to determine the optical constants of thin metal layers deposited on dielectric substrates such as glass or CaF(2). The layers were produced by evaporating gold or silver in a vacuum, and the coverage, that is the deposited mass per area, was chosen in the range 80-1200 mg m(-2) for gold, which refers to thicknesses in the lower nanometer range; in the case of the specifically lighter silver, about half the coverage was applied. At low coverage a metal island structure is obtained, which gives rise to surface-enhanced infrared absorption (SEIRA). Depending on the coverage, the deposited films exhibit either dielectric or metallic optical properties. Atomic force microscopy and conductivity measurements complement the spectroscopic observation.
应用红外光谱椭偏仪测定沉积在玻璃或CaF₂等介电基底上的薄金属层的光学常数。这些金属层是通过在真空中蒸发金或银制备的，金的覆盖度（即单位面积的沉积质量）选择在80 - 1200 mg m⁻²范围内，这对应于较低纳米范围的厚度；对于密度特别小的银，覆盖度约为金的一半。在低覆盖度下会形成金属岛结构，从而产生表面增强红外吸收（SEIRA）。根据覆盖度的不同，沉积的薄膜表现出介电或金属光学性质。原子力显微镜和电导率测量补充了光谱观测。
