Sand Salomon, Filipsson Agneta Falk, Victorin Katarina
Institute of Environmental Medicine, Karolinska Institutet, PO Box 210, 17177 Stockholm, Sweden.
Regul Toxicol Pharmacol. 2002 Oct;36(2):184-97. doi: 10.1006/rtph.2002.1578.
The benchmark dose (BMD) method was evaluated using the USEPA BMD software. Dose-response data on cleft palate and hydronephrosis for a number of related polyhalogenated aromatic compounds were obtained from the literature. According to chi(2) test statistics, each dichotomous USEPA model failed to adequately describe only 1 of 12 cleft palate data sets. For hydronephrosis, the models were discriminated to a higher extent according to global goodness-of-fit. NOAELs for cleft palate corresponded to BMDLs (the approximate lower confidence limit on the BMD) for extra risks in the range of 5% or below. Model dependence of the BMDL estimate was more pronounced at lower levels of benchmark response (BMR). A BMR of 5% (extra risk) is recommended for cleft palate since model differences at this level were limited for all data. In addition, at BMRs of 5-10% the BMDL for all models was little affected by the specified confidence limit size (in the 90-99% range). For BMDL determination a conservative model selection approach was applied. At the suggested level of BMR (5%) this procedure resulted in use of the same model (multistage model) for the cleft palate endpoint in general. Akaike's information criterion (AIC) was considered for comparison between models. Determination of appropriateness of use of such methods in dose-response applications requires further analysis.
使用美国环境保护局(USEPA)的基准剂量(BMD)软件对基准剂量法进行了评估。从文献中获取了多种相关多卤代芳香族化合物的腭裂和肾积水剂量反应数据。根据卡方检验统计,美国环境保护局的每个二分模型仅未能充分描述12个腭裂数据集当中的1个。对于肾积水,根据整体拟合优度,模型之间的区分度更高。腭裂的未观察到有害作用水平(NOAEL)对应于额外风险在5%或以下范围内的基准剂量下限(BMDL,即BMD的近似下限置信限)。在较低的基准反应(BMR)水平下,BMDL估计值对模型的依赖性更为明显。对于腭裂,建议采用5%(额外风险)的BMR,因为在此水平上所有数据的模型差异都很有限。此外,在5%-10%的BMR下,所有模型的BMDL受指定置信限大小(在90%-99%范围内)的影响很小。在确定BMDL时,采用了保守的模型选择方法。在建议的BMR水平(5%)下,该程序通常会导致腭裂终点采用相同的模型(多阶段模型)。考虑使用赤池信息准则(AIC)进行模型间比较。确定此类方法在剂量反应应用中的适用性需要进一步分析。