Su Ming-Der
School of Medicinal and Applied Chemistry, Kaohsiung Medical University, Kaohsiung 80708, Taiwan, Republic of China.
J Am Chem Soc. 2003 Feb 19;125(7):1714-5. doi: 10.1021/ja0210751.
A theoretical study of the mechanism of the reaction of stable silylenes with halocarbons has been carried out using the B3LYP density functional method. The main findings are as follows: (1) Lewis acid-base complexes formed between silylenes and halocarbons do not play a role in silylene insertion chemistry into halocarbons; therefore, the acid-base complex mechanism proposed by West et al. (J. Am. Chem. Soc. 2002, 124, 4186) is not appropriate to describe the disilane formation reaction. (2) The disilane formation reactions follow the energetically favorable general reaction pathway (X = halogen): (i) Y2Si: + HCX3 --> TS1 --> Y2XSi-CHX2. (ii) Y2Si: + Y2XSi-CHX2 --> TS2 --> Y2XSi-SiY2CHX2. (3) The observed preference of stable silylenes to undergo C-X bond insertion rather than C-H bond has been investigated. The theoretical findings suggest that this preference is a result of the thermodynamic factor. (4) Stable silylenes prefer to insert into a C-Br rather than a C-Cl bond because the energy barrier to insertion is lower, and the reaction is more exothermic.
