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高能电子束中的界面扰动效应。

Interface perturbation effects in high-energy electron beams.

作者信息

Verhaegen Frank

机构信息

Medical Physics Department, McGill University, Montreal General Hospital, 1650 Cedar Avenue, Montreal, Québec, H3G1A4. Canada.

出版信息

Phys Med Biol. 2003 Mar 21;48(6):687-705. doi: 10.1088/0031-9155/48/6/301.

Abstract

Near interfaces between two different media exposed to high-energy electron beams substantial dose and fluence perturbations due to backscatter can be observed. In this work, dose and fluence perturbations were studied for 4-19 MeV electron beams at backscatter interfaces of polystyrene, graphite, water, aluminium and lead. Measurements of relative dose using an NPL-designed thin-window plane-parallel ion chamber and a Markus ion chamber were performed to determine the effect of different interface materials and thicknesses. Results of Monte Carlo simulations with the EGSnrc code, including models of the ion chambers, were found to be in excellent agreement with the measurements. The well-documented increasing dose perturbation with increasing effective atomic number of the backscatter material and decreasing electron beam energy was confirmed. Simulations in a simplified slab geometry showed that, despite the decrease of average electron energy with depth in water, the dose perturbations decrease with increasing depth of the interface in water for all the materials in the study. This was ascribed to the change of the electron angular distribution with depth which has a different effect in water and in the presence of a high-Z interface. Electron fluence perturbations near a lead/water interface were found to cause small differences in unrestricted mass collision stopping power ratios, water to air. Effects of bremsstrahlung photons, characteristic photons and positrons from the backscattering material were found to be insignificant for electron interface dosimetry. When comparing simulations using EGSnrc and the older version of the same code, EGS4, underestimations of the dose perturbation effects of up to 7% were found when using the latter code to simulate 4 MeV electrons irradiating a lead/water interface. It is concluded that EGSnrc is a highly suitable tool for electron interface dosimetry studies.

摘要

在暴露于高能电子束的两种不同介质的界面附近,可以观察到由于反向散射而产生的显著剂量和注量扰动。在这项工作中,研究了4-19 MeV电子束在聚苯乙烯、石墨、水、铝和铅的反向散射界面处的剂量和注量扰动。使用英国国家物理实验室设计的薄窗平行板电离室和马克斯电离室进行了相对剂量测量,以确定不同界面材料和厚度的影响。发现使用EGSnrc代码进行的蒙特卡罗模拟结果,包括电离室模型,与测量结果非常吻合。证实了文献中记载的随着反向散射材料有效原子序数的增加和电子束能量的降低,剂量扰动增加的现象。在简化的平板几何结构中的模拟表明,尽管水中平均电子能量随深度降低,但对于研究中的所有材料,剂量扰动随水中界面深度的增加而减小。这归因于电子角分布随深度的变化,其在水中和存在高Z界面时具有不同的影响。发现铅/水界面附近的电子注量扰动会导致水与空气的无限制质量碰撞阻止本领比出现微小差异。发现轫致辐射光子、特征光子和来自反向散射材料的正电子对电子界面剂量学的影响微不足道。在比较使用EGSnrc和同一代码的旧版本EGS4进行的模拟时,发现使用后者代码模拟4 MeV电子辐照铅/水界面时,剂量扰动效应的低估高达7%。得出的结论是,EGSnrc是电子界面剂量学研究的非常合适的工具。

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