Krishna Prasad S, Sandhya K L, Shankar Rao D S, Negi Y S
Centre for Liquid Crystal Research, Jalahalli, Bangalore 560 013, India.
Phys Rev E Stat Nonlin Soft Matter Phys. 2003 May;67(5 Pt 1):051701. doi: 10.1103/PhysRevE.67.051701. Epub 2003 May 1.
We present the study of the dynamics of the recently reported photoinduced smectic-C(*)(alpha)-smectic-A transition. High resolution time-resolved dielectric dispersion measurements carried out during the photoisomerization process demonstrate that the magnitude of the uv intensity mimics the role played by temperature in determining the behavior of the soft mode relaxation. We also show that the uv intensity dependence of the soft mode relaxation frequency f(R) in the photoinduced smectic-A phase can be described with a functional form similar to that derived for the temperature dependence of f(R) and compare the experimentally determined critical exponent with the theoretically predicted for the Ising and three-dimensional XY universality classes. Our study illustrates an interesting feature, namely, the magnitude of light intensity can be treated like a thermodynamic variable such as temperature and pressure to study phase transitions in general.
我们展示了对最近报道的光致近晶 - C(*)(α) - 近晶 - A 转变动力学的研究。在光异构化过程中进行的高分辨率时间分辨介电色散测量表明,紫外光强度的大小模拟了温度在决定软模弛豫行为中所起的作用。我们还表明,光致近晶 - A 相中软模弛豫频率 f(R)对紫外光强度的依赖性可以用一种类似于从 f(R)的温度依赖性推导出来的函数形式来描述,并将实验确定的临界指数与伊辛和三维 XY 普适类的理论预测值进行比较。我们的研究说明了一个有趣的特征,即光强度的大小可以像温度和压力等热力学变量一样来处理,以一般性地研究相变。