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利用氦射频等离子体通过原子发射检测监测水的纳流率。

Monitoring nano-flow rate of water by atomic emission detection using helium radio-frequency plasma.

作者信息

Nakagama Tatsuro, Maeda Tsuneaki, Uchiyama Katsumi, Hobo Toshiyuki

机构信息

Division of Applied Chemistry, Graduated School of Engineering, Tokyo Metropolitan University, 1-1 Minamiosawa, Hachioji, Tokyo, 192-0397, Japan.

出版信息

Analyst. 2003 Jun;128(6):543-6. doi: 10.1039/b300032j.

DOI:10.1039/b300032j
PMID:12866864
Abstract

Recently, high-performance nano-scale flow pumping systems have been developed for micro and miniaturized analysis systems. A novel device capable of measuring and monitoring nanoliter scale flow rates has been required for the further development of the pumping system. In this study, an atomic emission detector using helium radio-frequency plasma (RFP-AED) was used for the measurement of the nanoliter scale flow rate of water by quantitatively detecting the emission from hydrogen in the water molecules. Monitoring nano-flow rates of water in the range up to 1.0 microl min(-1), and the change in the flow rate by the indication of the ratio of the emissions of H (656.3 nm) and He (667.8 nm) were successful. At present, the lowest flow rate that could be determined reproducibly was 4 nl min(-1) calculated as five times the standard deviation of the background noise. Additionally, similar evaluations for the deviation of each flow rate by using the RFP-AED and a flow-injection system were produced.

摘要

最近,已为微型和小型分析系统开发了高性能纳米级流动泵送系统。为了泵送系统的进一步发展,需要一种能够测量和监测纳升级流速的新型装置。在本研究中,使用了一种利用氦射频等离子体的原子发射检测器(RFP-AED),通过定量检测水分子中氢的发射来测量水的纳升级流速。成功监测了高达1.0微升/分钟范围内的水的纳流速,以及通过H(656.3纳米)和He(667.8纳米)发射率之比的指示来监测流速的变化。目前,可重复测定的最低流速为4纳升/分钟,计算为背景噪声标准偏差的五倍。此外,还使用RFP-AED和流动注射系统对每种流速的偏差进行了类似评估。

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