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用萘酚衍生物席夫碱通过阴极吸附溶出伏安法选择性测定痕量铜(II)

Selective determination of trace copper(II) by cathodic adsorptive stripping voltammetry with a naphthol-derivative Schiff's base.

作者信息

Shamsipur Mojtaba, Saeidi Mahboubeh, Sharghi Hashem, Naeimi Hossein

机构信息

Department of Chemistry, Razi University, Kermanshah, Iran.

出版信息

Ann Chim. 2003 May-Jun;93(5-6):561-9.

Abstract

A selective and sensitive stripping voltammetric method for the determination of trace amounts of copper(II) with a recently synthesized naphthol-derivative Schiff's base (2,2'-[1,2-ethanediylbis(nitriloethylidyne)]bis(1-naphthalene)) is presented. The method is based on adsorptive accumulation of the resulting copper-Schiff's base complex on a hanging mercury drop electrode, followed by the stripping voltammetric measurement at the reduction current of adsorbed complex at -0.15 V (vs. Ag/AgCl). The optimal conditions for the stripping analysis of copper include pH 5.5 to 6.5, 8 microM Schiff's base and an accumulation potential of -0.05 V (vs. Ag/AgCI). The peak current is linearly proportional to the copper concentration over a range 2.3-50.8 ng ml(-1) with a limit of detection of 1.9 ng ml(-1). The accumulation time and RSD are 90 s and (3.2-3.5)%, respectively. The method was applied to the determination of copper in some analytical grade salts, tap water, human serum and sheep's liver.

摘要

本文介绍了一种使用最近合成的萘酚衍生物席夫碱(2,2'-[1,2-乙二基双(亚氨乙基)]双(1-萘))测定痕量铜(II)的选择性和灵敏的溶出伏安法。该方法基于所生成的铜-席夫碱络合物在悬汞滴电极上的吸附积累,随后在-0.15 V(相对于Ag/AgCl)下对吸附络合物的还原电流进行溶出伏安测量。铜溶出分析的最佳条件包括pH 5.5至6.5、8 microM席夫碱和-0.05 V(相对于Ag/AgCl)的积累电位。在2.3 - 50.8 ng ml⁻¹范围内,峰电流与铜浓度呈线性比例关系,检测限为1.9 ng ml⁻¹。积累时间和相对标准偏差分别为90 s和(3.2 - 3.5)%。该方法应用于一些分析纯盐、自来水、人血清和羊肝中铜的测定。

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