通过29Si CP/MAS NMR研究气相沉积在二氧化硅上的γ-氨丙基三乙氧基硅烷的新键合模式。
New bonding modes of gas-phase deposited gamma-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR.
作者信息
Ek Satu, Iiskola Eero I, Niinistö Lauri, Pakkanen Tuula T, Root Andrew
机构信息
Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FIN-02015 Espoo, Finland.
出版信息
Chem Commun (Camb). 2003 Aug 21(16):2032-3. doi: 10.1039/b305534e.
Besides the well-known reaction between the ethoxy groups of the silane end of the gamma-aminopropyltriethoxysilane (APTS) molecule and the silanols of silica, the amino ends of APTS molecules were observed to react in the gas phase with ethoxy groups of other APTS molecules and silanols of silica at elevated temperatures on the silica surface, dehydroxylated at 600 degrees C, forming Si-N linkages, as established by 29Si CP/MAS NMR.
除了γ-氨丙基三乙氧基硅烷（APTS）分子硅烷端的乙氧基与二氧化硅的硅醇之间的著名反应外，还观察到在600℃脱羟基的二氧化硅表面，APTS分子的氨基端在高温下会与其他APTS分子的乙氧基以及二氧化硅的硅醇在气相中发生反应，形成Si-N键，这一点通过29Si CP/MAS NMR得以证实。
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