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Streptomycin-resistant mutant production in a continuous-flow UV mutation device.

作者信息

Kai G, Weber A S

机构信息

Department of Civil Engineering, State University of New York, Buffalo 14260.

出版信息

J Ind Microbiol. 1991 Sep;8(2):107-12. doi: 10.1007/BF01578761.

DOI:10.1007/BF01578761
PMID:1367590
Abstract

A continuous-flow UV-induced mutation device which incorporates starting strain cultivation, UV irradiation and mutant reproduction was conceptualized and tested in this study using streptomycin resistance as an indicator of mutant production. For the experimental conditions employed and populations used, the mutation frequency for streptomycin resistance ranged from 10(-4) to 10(-5) cfu/ml. These mutation frequencies are comparable with conventional batch UV mutation methods and represent a gain of 3 orders of magnitude over the spontaneous mutation frequency.

摘要

相似文献

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本文引用的文献

1
The Quantitative Estimation of Radiation Induced Mutations to Streptomycin Resistance in Escherichia Coli.大肠杆菌中辐射诱导链霉素抗性突变的定量估计
Genetics. 1954 May;39(3):296-306. doi: 10.1093/genetics/39.3.296.
2
Mutational specificity in bacteria.细菌中的突变特异性。
Annu Rev Genet. 1983;17:215-38. doi: 10.1146/annurev.ge.17.120183.001243.
3
Radiation-induced mutations and their repair.辐射诱导的突变及其修复。
Science. 1966 Jun 3;152(3727):1345-53. doi: 10.1126/science.152.3727.1345.
4
Use of mutagens in the improvement of production strains of microorganisms.诱变剂在微生物生产菌株改良中的应用。
Folia Microbiol (Praha). 1971;16(3):197-204. doi: 10.1007/BF02884208.
5
The biochemistry of mutagenesis.诱变的生物化学
Annu Rev Biochem. 1976;45:11-37. doi: 10.1146/annurev.bi.45.070176.000303.