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The effect of the limited availability of H2O2 in the competitive deposition of sulfur and oxidized nitrogen.

作者信息

Méndez M R, Souto J A, Casares J J, Lucas T, Carmichael G R

机构信息

Department of Chemical Engineering, University of Santiago de Compostela, 15782 Avda das Ciencias, s/n E-15706 Santiago de Compostela, Spain.

出版信息

Chemosphere. 2003 Dec;53(9):1165-78. doi: 10.1016/S0045-6535(03)00614-3.

Abstract

To understand the influence of the reduction of SO2 emissions from a single source in the S and N deposition around its local environment, the application of the Sulphur Transport Eulerian Model 2 (STEM-II) was introduced in this paper. Observed local deposition patterns were analysed and explained in terms of the main processes involved in the pollutants deposition. It was necessary to take into account the limited availability of H2O2 because of its influence on both S(IV) and oxidized nitrogen deposition. In order to estimate the quantitative relationship between the SO2 emissions reduction and the observed S and N deposition patterns, these processes were simulated for different meteorological conditions. Simulation results were in agreement with both observed deposition patterns and limited availability of H2O2, specially if significant changes in the S deposition patterns were considered. Both observed and estimated S deposition patterns changed their top value location from the Southwest (1990) to the Northwest (1997) of the domain, because of the reduction of dry deposition. The global reduction of total S depositions, estimated and observed, were in good agreement too. Model simulations could explain the higher S dry deposition reduction, considering the emissions reduction strategy applied.

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