Ruiz Ricardo, Nickel Bert, Koch Norbert, Feldman Leonard C, Haglund Richard F, Kahn Antoine, Family Fereydoon, Scoles Giacinto
Vanderbilt University, Department of Physics and Astronomy, Nashville, Tennessee 37235, USA.
Phys Rev Lett. 2003 Sep 26;91(13):136102. doi: 10.1103/PhysRevLett.91.136102. Epub 2003 Sep 23.
Scaling behavior of the island size distribution through a universal scaling function f(u) is demonstrated for submonolayer pentacene islands in the aggregation regime (0.1<theta<0.5) grown on oxidized silicon surfaces. The distribution of f(u) suggests that four molecules constitute the smallest stable island. The structure factor S(k) of the submonolayer films calculated from AFM micrographs compares well with diffuse x-ray intensities from in situ experiments. The structure factor was decomposed into the contribution from the average island shape and the interisland distribution confirming that a unique characteristic length scale regulates the growth dynamics.
通过通用标度函数f(u),展示了在氧化硅表面生长的聚集态(0.1<θ<0.5)亚单层并五苯岛的岛尺寸分布的标度行为。f(u)的分布表明四个分子构成最小的稳定岛。由原子力显微镜图像计算得到的亚单层薄膜的结构因子S(k)与原位实验的漫散射x射线强度吻合良好。结构因子被分解为平均岛形状和岛间分布的贡献,证实了一个独特的特征长度尺度调节生长动力学。