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[电铸烤瓷熔附金属冠在种植体基台上的适配性]

[Fit of electroformed porcelain-fused-to-metal crown on implant abutment].

作者信息

Yamaguchi Yoko, Takahashi Hidekazu, Shiota Makoto, Iwasaki Naohiko

机构信息

Department of Masticatory Function Rehabilitation, Division of Oral Health Sciences, Graduate School, Tokyo Medical and Dental University.

出版信息

Kokubyo Gakkai Zasshi. 2003 Sep;70(3):175-81. doi: 10.5357/koubyou.70.175.

Abstract

This study compared the adaptation of a conventional and an electroformed porcelain-fused-to-metal crown. A master model was selected from an ITI implant with a solid abutment (height: 4 mm). Conventional cast metal frameworks of 0.7 mm thickness were prepared with a high noble metal alloy (Degudent U, Degussa) for porcelain fusing (n = 5). Electroformed frameworks of 0.2 mm thickness were determined using pure gold deposition on the abutment using the Auro-Galva-Crown system (AGC, Wieland) (n = 5). Subsequently, a porcelain (Super Porcelain AAA, Noritake) was fused to each framework. Internal gaps between the framework and its abutment were determined using the thickness of a silicone fit checking material. The gaps were measured both before and after porcelain fusing. The thicknesses of the silicone layer of the electroformed and the conventional porcelain-fused-to-metal crown were 34.6 and 38.5 microns at the margin, 33.2 and 39.6 microns at the internal slope, 22.0 and 33.0 microns at the axial, 58.6 and 65.1 microns at the occlusal, respectively. Three-way analysis of variance revealed that the mean gaps in the electroformed porcelain-fused-to-metal crown were significantly thinner than those in the conventional porcelain-fused-to-metal crown (p < 0.05). The electroformed porcelain-fused-to-metal crown showed better adaptability than the conventional porcelain-fused-to-metal crown regardless of porcelain fusing.

摘要

本研究比较了传统烤瓷熔附金属冠和电铸烤瓷熔附金属冠的适配性。从带有实心基台(高度:4毫米)的ITI种植体中选取一个主模型。用高贵金属合金(Degudent U,德固赛)制备厚度为0.7毫米的传统铸造金属框架用于熔瓷(n = 5)。使用Auro - Galva - Crown系统(AGC,维他)通过在基台上纯金沉积来确定厚度为0.2毫米的电铸框架(n = 5)。随后,将一种瓷(超级瓷AAA,Noritake)熔附到每个框架上。使用硅橡胶适配检查材料的厚度来确定框架与其基台之间的内部间隙。在熔瓷前后均测量间隙。电铸烤瓷熔附金属冠和传统烤瓷熔附金属冠的硅橡胶层厚度在边缘处分别为34.6微米和38.5微米,在内侧斜面处分别为33.2微米和39.6微米,在轴向处分别为22.0微米和33.0微米,在咬合面处分别为58.6微米和65.1微米。三因素方差分析显示,电铸烤瓷熔附金属冠的平均间隙明显比传统烤瓷熔附金属冠的更薄(p < 0.05)。无论是否进行熔瓷,电铸烤瓷熔附金属冠都比传统烤瓷熔附金属冠表现出更好的适配性。

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