Shimojo M, Mitsuishi K, Tanaka M, Han M, Furuya K
National Institute for Materials Science, Nano-Materials Laboratory, 3-13 Sakura, Tsukuba 305-0003, Japan.
J Microsc. 2004 Apr;214(Pt 1):76-9. doi: 10.1111/j.0022-2720.2004.01307.x.
Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.
使用带有场发射枪的扫描透射电子显微镜进行电子束诱导沉积，以制造纳米尺寸的结构。在显微镜腔室的基板附近引入少量金属有机气体，并照射聚焦电子束。通过扫描束位置制造二维和三维结构。在使用恒定气体通量的情况下，独立结构的最小线宽为8nm。这种8nm的线宽被认为是通过采用高加速电压（这导致小探针尺寸）和最佳扫描速度实现的。
