Nakai K, Kubota Y, Kosaka H
Department of Dermatology, Faculty of Medicine, Kagawa University, 1750-1 Ikenobe, Miki-Kita, Kagawa 761-0793, Japan.
Br J Dermatol. 2004 Apr;150(4):640-6. doi: 10.1111/j.0007-0963.2004.05867.x.
In human skin, inducible nitric oxide synthase (iNOS) appears to be a key enzyme during wound healing and has roles in protection from infection. We speculated that diabetic skin complications such as delayed wound healing and skin infection were due to iNOS activity altered by high glucose in skin keratinocytes.
The purpose of this study was to see how high levels of glucose affect iNOS activity in the human keratinocyte cell line (HaCaT).
HaCaT cells were exposed to high glucose for 1 day or 10 days. We measured nitric oxide (NO) end product nitrite in the culture medium using the Griess reagent, and intracellular tetrahydrobiopterin (BH(4), a cofactor of NOS) content by using high-performance liquid chromatography, analysed the expression level of iNOS mRNA by the reverse transcriptase-polymerase chain reaction method and evaluated the DNA binding activity of nuclear factor kappa B (NF-kappaB) by enzyme-immunoassay.
Short-term exposure (1 day) to a high level of glucose increased BH(4) and iNOS activity at the post-translational level. However, long-term exposure (10 days) to high glucose downregulates NF-kappaB binding activity and inhibits iNOS transcription and its activity.
Pretreatment with high glucose for 10 days down-regulated NF-kappaB activity and inhibited iNOS transcription and NO production, implying the involvement of a deficiency in NO synthesis in both skin infection and impaired wound healing in diabetic patients.
在人类皮肤中,诱导型一氧化氮合酶(iNOS)似乎是伤口愈合过程中的关键酶,在预防感染方面发挥作用。我们推测,糖尿病皮肤并发症如伤口愈合延迟和皮肤感染是由于皮肤角质形成细胞中高糖改变了iNOS活性所致。
本研究旨在观察高糖水平如何影响人角质形成细胞系(HaCaT)中的iNOS活性。
将HaCaT细胞暴露于高糖环境1天或10天。我们使用格里斯试剂测量培养基中的一氧化氮(NO)终产物亚硝酸盐,并通过高效液相色谱法测量细胞内四氢生物蝶呤(BH4,一氧化氮合酶的一种辅因子)含量,采用逆转录聚合酶链反应法分析iNOS mRNA的表达水平,并通过酶免疫测定法评估核因子κB(NF-κB)的DNA结合活性。
短期暴露(1天)于高糖水平会在翻译后水平增加BH4和iNOS活性。然而,长期暴露(10天)于高糖会下调NF-κB结合活性并抑制iNOS转录及其活性。
高糖预处理10天会下调NF-κB活性并抑制iNOS转录和NO生成,这意味着糖尿病患者皮肤感染和伤口愈合受损均与NO合成不足有关。