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三氟硅基肼中强烈的分子内二级硅氮键。

Strong intramolecular secondary si.N bonds in trifluorosilylhydrazines.

作者信息

Vojinović Krunoslav, McLachlan Lorna J, Hinchley Sarah L, Rankin David W H, Mitzel Norbert W

机构信息

Institut für Anorganische und Analytische Chemie, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Strasse 8, 48149 Münster, Germany.

出版信息

Chemistry. 2004 Jun 21;10(12):3033-42. doi: 10.1002/chem.200400069.

Abstract

The simple silylhydrazines F(3)SiN(Me)NMe(2) (1), F(2)Si(N(Me)NMe(2))(2) (2), and F(3)SiN(SiMe(3))NMe(2) (3) have been prepared by reaction of SiF(4) with LiN(Me)NMe(2) and LiN(SiMe(3))NMe(2), while F(3)SiN(SnMe(3))NMe(2) (4) was prepared from SiF(4) and (Me(3)Sn)(2)NNMe(2) (5). The compounds were characterized by gas-phase IR and multinuclear NMR spectroscopy ((1)H, (13)C, (14/15)N, (19)F, (29)Si, (119)Sn), as well as by mass spectrometry. The crystal structures of compounds 1-5 were determined by X-ray crystallography. The structures of free molecules 1 and 3 were determined by gas-phase electron diffraction. The structures of 1, 2, and 4 were also determined by ab initio calculations at the MP2/6-311+G** level of theory. These structural studies constitute the first experimental proof for the presence of strong Si.N beta-donor-acceptor bonds between the SiF(3) and geminal NMe(2) groups in silylhydrazines. The strength of these non-classical Si.N interactions is strongly dependent on the nature of the substituent at the alpha-nitrogen atom of the SiNN unit, and has the order 3>4>1. The valence angles at these extremely deformed alpha-nitrogen atoms, and the Si.N distances are (crystal/gas): 1 104.2(1)/106.5(4) degrees, 2.438(1)/2.510(6) A; 3 83.6(1)/84.9(4) degrees, 2.102(1)/2.135(9) A; 4 89.6(1) degrees, 2.204(2) A.

摘要

通过使四氟化硅与二甲基肼锂(LiN(Me)NMe(2))和N-甲基-N-三甲基硅基肼锂(LiN(SiMe(3))NMe(2))反应,制备了简单的硅基肼F(3)SiN(Me)NMe(2)(1)、F(2)Si(N(Me)NMe(2))(2)(2)和F(3)SiN(SiMe(3))NMe(2)(3),而F(3)SiN(SnMe(3))NMe(2)(4)则由四氟化硅与二甲基-N,N'-双(三甲基锡基)肼((Me(3)Sn)(2)NNMe(2),5)制备得到。这些化合物通过气相红外光谱和多核核磁共振光谱((1)H、(13)C、(14/15)N、(19)F、(29)Si、(119)Sn)以及质谱进行了表征。化合物1 - 5的晶体结构通过X射线晶体学确定。游离分子1和3的结构通过气相电子衍射确定。1、2和4的结构也通过在MP2/6 - 311 + G**理论水平下的从头算计算确定。这些结构研究构成了硅基肼中SiF(3)与偕二甲基(geminal NMe(2))基团之间存在强Si.N β - 给体 - 受体键的首个实验证据。这些非经典Si.N相互作用的强度强烈依赖于SiNN单元α - 氮原子上取代基的性质,顺序为3 > 4 > 1。这些极度变形的α - 氮原子处的价角以及Si.N距离为(晶体/气相):1 104.2(1)/106.5(4)°,2.438(1)/2.510(6) Å;3 83.6(1)/84.9(4)°,2.102(1)/2.135(9) Å;4 89.6(1)°,2.204(2) Å。

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