Yokoi Hideki, Shoji Yuya, Shin Etsu, Mizumoto Tetsuya
Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.
Appl Opt. 2004 Aug 20;43(24):4745-52. doi: 10.1364/ao.43.004745.
An interferometric optical isolator that employs a nonreciprocal phase shift was studied. The optical isolator consisted of an interferometer with distinct layer structures. A traveling light wave underwent distinct nonreciprocal phase shifts such that the optical isolator could be operated in a unidirectional magnetic field. The optical isolator, in which the waveguide had a HfO2 cladding layer in one of the arms, was designed at a wavelength of 1.55 microm. The propagation distance of the nonreciprocal phase shifter required for the isolator's operation was less than 1.5 mm. The device's total length was less than 2 mm. An optical isolator with distinct layer structures was fabricated and evaluated. An isolation ratio of approximately 9.9 dB was obtained in the unidirectional magnetic field.
研究了一种采用非互易相移的干涉式光隔离器。该光隔离器由具有不同层结构的干涉仪组成。行进的光波经历了不同的非互易相移,使得光隔离器能够在单向磁场中运行。该光隔离器在其中一个臂中具有HfO2包层的波导,其设计波长为1.55微米。光隔离器运行所需的非互易移相器的传播距离小于1.5毫米。该器件的总长度小于2毫米。制造并评估了具有不同层结构的光隔离器。在单向磁场中获得了约9.9 dB的隔离比。