Eichenlaub Sean, Gelb Anne, Beaudoin Steve
Department of Chemical and Materials Engineering, Arizona State University, Tempe, AZ 85287, USA.
J Colloid Interface Sci. 2004 Dec 15;280(2):289-98. doi: 10.1016/j.jcis.2004.08.017.
The effects of different surface roughness models on a previously developed van der Waals adhesion model were examined. The van der Waals adhesion model represented surface roughness with a distribution of hemispherical asperities. It was found that the constraints used to define the asperity distribution on the surface, which were determined from AFM scans, varied with scan size and thus were not constant for all surfaces examined. The greatest variation in these parameters occurred with materials that had large asperities or with materials where a large fraction of the surface was covered by asperities. These rough surfaces were modeled with fractals and also with a fast Fourier transform algorithm. When the model surfaces generated using the Fourier transforms are used in the adhesion model, the model accurately predicts the experimentally observed adhesion forces measured with the AFM.
研究了不同表面粗糙度模型对先前开发的范德华力粘附模型的影响。范德华力粘附模型用半球形微凸体分布来表示表面粗糙度。结果发现，用于定义表面微凸体分布的约束条件（由原子力显微镜扫描确定）随扫描尺寸而变化，因此对于所有检测的表面并非恒定不变。这些参数的最大变化发生在具有大微凸体的材料上，或者表面大部分被微凸体覆盖的材料上。这些粗糙表面用分形法以及快速傅里叶变换算法进行建模。当将使用傅里叶变换生成的模型表面用于粘附模型时，该模型能够准确预测用原子力显微镜测量的实验观察到的粘附力。
