Huang C, Jiang W, Chen C
Institute of Environmental Engineering, National Chiao Tung University, Hsinchu, Chinese Taiwan.
Water Sci Technol. 2004;50(12):133-8.
Microfiltration (MF) coupled with pretreatment by coagulation was adopted in the treatment of chemical mechanical polishing (CMP) wastewater from IC manufacturing plants, containing high concentrations of silica. Poly-aluminium chloride (PACl) was the coagulant, while the cationic polyacrylamide (PAA) was the flocculant aid. Preliminary tests were performed with the raw CMP wastewater in order to determine the optimal coagulation condition for subsequent microfiltration. Analysis of the particle size distribution shows that nearly all silica particles were enlarged from nano scale to at least 4 microm in diameter after the pre-treatment. The pre-treated wastewater was then filtered through a polytetrafluoroethylene (PTFE) membrane with a pore size 0.5 microm at a constant vacuum pressure. Trace amounts of PAA in addition to the PACl coagulation can effectively increases the permeate flux.
采用微滤（MF）结合混凝预处理的方法处理集成电路制造工厂含高浓度二氧化硅的化学机械抛光（CMP）废水。以聚合氯化铝（PACl）作为混凝剂，阳离子聚丙烯酰胺（PAA）作为助凝剂。对CMP原废水进行初步试验，以确定后续微滤的最佳混凝条件。粒径分布分析表明，预处理后几乎所有二氧化硅颗粒都从纳米级增大到至少直径4微米。然后将预处理后的废水在恒定真空压力下通过孔径为0.5微米的聚四氟乙烯（PTFE）膜进行过滤。除PACl混凝外，痕量的PAA能有效提高渗透通量。
