光子筛光刻技术

Photon-sieve lithography.

作者信息

Menon Rajesh, Gil Dario, Barbastathis George, Smith Henry I

机构信息

Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.

出版信息

J Opt Soc Am A Opt Image Sci Vis. 2005 Feb;22(2):342-5. doi: 10.1364/josaa.22.000342.

DOI:10.1364/josaa.22.000342

PMID:15717565

Abstract

We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.

摘要

我们展示了首个光刻结果，该结果使用高数值孔径光子筛作为扫描光束光刻系统中的聚焦元件[《真空科学与技术杂志B》21, 2810 (2003)]。光子筛是新型光学元件，与传统衍射光学元件如波带片相比，具有更高分辨率和更好图像对比度的优势[《自然》414, 184 (2001)]。我们制造出了迄今报道的数值孔径最高的光子筛，并通过实验验证了其聚焦特性。我们提出了两种光子筛的新设计，它们有可能显著提高聚焦效率。